No Cover Image

Journal article 378 views 44 downloads

A Low‐Temperature Batch Process for the Deposition of High‐Quality Conformal Alumina Thin Films for Electronic Applications

Gregory Burwell Orcid Logo, Klaudia Rejnhard, Jonathan Evans, Jacob Mitchell, Michael T. Grimes, Matt Elwin, Ardalan Armin Orcid Logo, Paul Meredith Orcid Logo

Advanced Engineering Materials, Volume: 25, Issue: 12

Swansea University Authors: Gregory Burwell Orcid Logo, Klaudia Rejnhard, Jonathan Evans, Jacob Mitchell, Matt Elwin, Ardalan Armin Orcid Logo, Paul Meredith Orcid Logo

  • 63132].pdf

    PDF | Version of Record

    © 2023 The Authors. Advanced Engineering Materials published by WileyVCH GmbH. Distributed under the terms of a Creative Commons Attribution 4.0 License (CC BY 4.0).

    Download (1.15MB)

Check full text

DOI (Published version): 10.1002/adem.202201901

Abstract

High-quality, alumina thin films are extensively used as dielectrics, passivation layers and barrier layers in electronics and many other applications. However, to achieve optimum stoichiometry and thus performance, the layers are often grown at elevated temperatures (> 200 °C) using techniques s...

Full description

Published in: Advanced Engineering Materials
ISSN: 1438-1656 1527-2648
Published: Wiley 2023
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa63132
Tags: Add Tag
No Tags, Be the first to tag this record!
Abstract: High-quality, alumina thin films are extensively used as dielectrics, passivation layers and barrier layers in electronics and many other applications. However, to achieve optimum stoichiometry and thus performance, the layers are often grown at elevated temperatures (> 200 °C) using techniques such as Atomic Layer Deposition (ALD). This is problematic for substrates or structures with low thermal budgets. In this work, alumina thin films were grown on 200 mm silicon substrates employing a versatile deposition method known as Molecular Vapour Deposition (MVD) at low deposition temperatures (35-150 °C). The chemical composition of the resulting films was investigated post-deposition using X-ray Photoelectron Spectroscopy (XPS) and Variable Angle Spectroscopic Ellipsometry (VASE), with fully stoichiometric Al2O3 achieved at deposition temperatures as low as 100 °C. Dielectric measurements confirm outstanding dielectric properties compared to typical thermal ALD layers deposited at much higher temperatures. We rationalise and understand this low-temperature deposition performance by considering the MVD reactor design and the ‘pump-type’ regime of precursor delivery versus the ‘flow-type’ regime of ALD. Our results clearly demonstrate that alumina thin films grown with MVD are highly versatile for electronic applications and are of particular relevance and interest for the high-volume processing of dielectric, passivation, and barrier layers at low temperatures.
Keywords: Atomic Layer Deposition, Molecular Vapour Deposition, Alumina, Flexible
College: Faculty of Science and Engineering
Funders: This work was supported by the Avenues of Commercialisation for Nano & Micro Technologies (ACNM) through the Welsh European Funding Office. This work was further supported by the Welsh Government's Sêr Cymru II Rising Star and Capacity Builder Accelerator Programs through the European Regional Development Fund, Welsh European Funding Office, and Swansea University Strategic Initiative in Sustainable Advanced Materials.
Issue: 12

Similar Items