Journal article 598 views
A Fullerene derivative as an electron beam resist for nanolithography
A. P. G. Robinson,
R. E. Palmer,
T. Tada,
T. Kanayama,
J. A. Preece,
Richard Palmer 
Applied Physics Letters, Volume: 72, Issue: 11, Pages: 1302 - 1304
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1063/1.120978
Abstract
A Fullerene derivative as an electron beam resist for nanolithography
| Published in: | Applied Physics Letters |
|---|---|
| ISSN: | 0003-6951 1077-3118 |
| Published: |
1998
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| Online Access: |
Check full text
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49480 |
| College: |
Faculty of Science and Engineering |
|---|---|
| Issue: |
11 |
| Start Page: |
1302 |
| End Page: |
1304 |