Journal article 724 views
Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography
A. P. G. Robinson,
R. E. Palmer,
T. Tada,
T. Kanayama,
M. T. Allen,
J. A. Preece,
K. D. M. Harris,
Richard Palmer 
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Volume: 18, Issue: 6, Start page: 2730
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1116/1.1322045
Abstract
Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography
| Published in: | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures |
|---|---|
| ISSN: | 0734211X |
| Published: |
2000
|
| Online Access: |
Check full text
|
| URI: | https://cronfa.swan.ac.uk/Record/cronfa49456 |
| College: |
Faculty of Science and Engineering |
|---|---|
| Issue: |
6 |
| Start Page: |
2730 |