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Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography

A. P. G. Robinson, R. E. Palmer, T. Tada, T. Kanayama, M. T. Allen, J. A. Preece, K. D. M. Harris, Richard Palmer Orcid Logo

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Volume: 18, Issue: 6, Start page: 2730

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1116/1.1322045

Published in: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
ISSN: 0734211X
Published: 2000
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URI: https://cronfa.swan.ac.uk/Record/cronfa49456
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last_indexed 2019-03-18T20:01:57Z
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spelling 2019-03-18T14:36:44.6335699 v2 49456 2019-03-18 Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 ACEM Journal Article Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures 18 6 2730 0734211X 31 12 2000 2000-12-31 10.1116/1.1322045 COLLEGE NANME Aerospace, Civil, Electrical, and Mechanical Engineering COLLEGE CODE ACEM Swansea University 2019-03-18T14:36:44.6335699 2019-03-18T14:36:44.4136352 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering A. P. G. Robinson 1 R. E. Palmer 2 T. Tada 3 T. Kanayama 4 M. T. Allen 5 J. A. Preece 6 K. D. M. Harris 7 Richard Palmer 0000-0001-8728-8083 8
title Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography
spellingShingle Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography
Richard Palmer
title_short Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography
title_full Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography
title_fullStr Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography
title_full_unstemmed Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography
title_sort Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 A. P. G. Robinson
R. E. Palmer
T. Tada
T. Kanayama
M. T. Allen
J. A. Preece
K. D. M. Harris
Richard Palmer
format Journal article
container_title Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures
container_volume 18
container_issue 6
container_start_page 2730
publishDate 2000
institution Swansea University
issn 0734211X
doi_str_mv 10.1116/1.1322045
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
published_date 2000-12-31T13:48:39Z
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score 11.048237

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