Palmer, R., Robinson, A. P. G., Palmer, R. E., Tada, T., Kanayama, T., & Preece, J. A. (1998). A Fullerene derivative as an electron beam resist for nanolithography. Applied Physics Letters, 72(11), pp. 1302-1304. doi:10.1063/1.120978

Palmer, Richard, A. P. G. Robinson, R. E. Palmer, T. Tada, T. Kanayama, and J. A. Preece. "A Fullerene Derivative As an Electron Beam Resist for Nanolithography." Applied Physics Letters 72, no. 11 (1998): 1302-1304.

Palmer, Richard, et al. "A Fullerene Derivative As an Electron Beam Resist for Nanolithography." Applied Physics Letters 72.11 (1998): 1302-1304.