Journal article 521 views
Exposure mechanism of fullerene derivative electron beam resists
A.P.G Robinson,
R.E Palmer,
T Tada,
T Kanayama,
E.J Shelley,
D Philp,
J.A Preece,
Richard Palmer 
Chemical Physics Letters, Volume: 312, Issue: 5-6, Pages: 469 - 474
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1016/s0009-2614(99)00871-4
Abstract
Exposure mechanism of fullerene derivative electron beam resists
| Published in: | Chemical Physics Letters |
|---|---|
| ISSN: | 00092614 |
| Published: |
1999
|
| Online Access: |
Check full text
|
| URI: | https://cronfa.swan.ac.uk/Record/cronfa49469 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| College: |
Faculty of Science and Engineering |
|---|---|
| Issue: |
5-6 |
| Start Page: |
469 |
| End Page: |
474 |