Palmer, R., Robinson, A., Palmer, R., Tada, T., Kanayama, T., Shelley, E., . . . Preece, J. (1999). Exposure mechanism of fullerene derivative electron beam resists. Chemical Physics Letters, 312(5-6), pp. 469-474. doi:10.1016/s0009-2614(99)00871-4

Palmer, Richard, A.P.G Robinson, R.E Palmer, T. Tada, T. Kanayama, E.J Shelley, D. Philp, and J.A Preece. "Exposure Mechanism of Fullerene Derivative Electron Beam Resists." Chemical Physics Letters 312, no. 5-6 (1999): 469-474.

Palmer, Richard, et al. "Exposure Mechanism of Fullerene Derivative Electron Beam Resists." Chemical Physics Letters 312.5-6 (1999): 469-474.