Journal article 1340 views
Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers
Journal of Applied Physics, Volume: 103, Issue: 5, Pages: 053708 - 053711
Swansea University Authors: Steve Wilks, Vincent Teng
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DOI (Published version): 10.1063/1.2888522
Abstract
Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers
Published in: | Journal of Applied Physics |
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ISSN: | 0021-8979 |
Published: |
2008
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URI: | https://cronfa.swan.ac.uk/Record/cronfa5570 |
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v2 5570 2013-09-03 Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers 948a547e27d969b7e192b4620688704d Steve Wilks Steve Wilks true false 98f529f56798da1ba3e6e93d2817c114 0000-0003-4325-8573 Vincent Teng Vincent Teng true false 2013-09-03 FGSEN Journal Article Journal of Applied Physics 103 5 053708 053711 0021-8979 31 12 2008 2008-12-31 10.1063/1.2888522 From a project that grew out of collaboration with Materials and Engineering Research Institute (MERI) at Sheffield Hallam University to understand the factors that affect the electronic properties of metal contacts to large bandgap materials. This paper successfully demonstrated the crucial interplay between the nanoscale structure of the metal-semiconductor interface and the resulting electrical properties. The author made a substantial contribution to the conception and design of the study, the organisation of the study and to the development of the theoretical model. COLLEGE NANME Science and Engineering - Faculty COLLEGE CODE FGSEN Swansea University 2023-06-23T18:12:52.7410297 2013-09-03T06:12:31.0000000 Faculty of Science and Engineering School of Biosciences, Geography and Physics - Physics Steve Wilks 1 Vincent Teng 0000-0003-4325-8573 2 |
title |
Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers |
spellingShingle |
Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers Steve Wilks Vincent Teng |
title_short |
Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers |
title_full |
Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers |
title_fullStr |
Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers |
title_full_unstemmed |
Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers |
title_sort |
Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers |
author_id_str_mv |
948a547e27d969b7e192b4620688704d 98f529f56798da1ba3e6e93d2817c114 |
author_id_fullname_str_mv |
948a547e27d969b7e192b4620688704d_***_Steve Wilks 98f529f56798da1ba3e6e93d2817c114_***_Vincent Teng |
author |
Steve Wilks Vincent Teng |
author2 |
Steve Wilks Vincent Teng |
format |
Journal article |
container_title |
Journal of Applied Physics |
container_volume |
103 |
container_issue |
5 |
container_start_page |
053708 |
publishDate |
2008 |
institution |
Swansea University |
issn |
0021-8979 |
doi_str_mv |
10.1063/1.2888522 |
college_str |
Faculty of Science and Engineering |
hierarchytype |
|
hierarchy_top_id |
facultyofscienceandengineering |
hierarchy_top_title |
Faculty of Science and Engineering |
hierarchy_parent_id |
facultyofscienceandengineering |
hierarchy_parent_title |
Faculty of Science and Engineering |
department_str |
School of Biosciences, Geography and Physics - Physics{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Biosciences, Geography and Physics - Physics |
document_store_str |
0 |
active_str |
0 |
published_date |
2008-12-31T18:12:47Z |
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1769514327897800704 |
score |
11.037603 |