Wilks, S., & Teng, V. (2008). Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers. Journal of Applied Physics, 103(5), pp. 053708-053711. doi:10.1063/1.2888522

Wilks, Steve, and Vincent Teng. "Ni∕Al[sub 0.2]Ga[sub 0.8]N Interfacial Reaction and Schottky Contact Formation Using High Quality Epitaxial Layers." Journal of Applied Physics 103, no. 5 (2008): 053708-053711.

Wilks, Steve, and Vincent Teng. "Ni∕Al[sub 0.2]Ga[sub 0.8]N Interfacial Reaction and Schottky Contact Formation Using High Quality Epitaxial Layers." Journal of Applied Physics 103.5 (2008): 053708-053711.