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Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography

Francis P. Gibbons, Alex P. G. Robinson, Richard E. Palmer, Mayanditheuar Manickam, Jon A. Preece, Richard Palmer Orcid Logo

Small, Volume: 2, Issue: 8-9, Pages: 1003 - 1006

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1002/smll.200500443

Published in: Small
ISSN: 1613-6810 1613-6829
Published: 2006
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URI: https://cronfa.swan.ac.uk/Record/cronfa49363
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first_indexed 2019-03-18T20:01:44Z
last_indexed 2019-03-18T20:01:44Z
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spelling 2019-03-18T14:33:29.0032197 v2 49363 2019-03-18 Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Journal Article Small 2 8-9 1003 1006 1613-6810 1613-6829 31 12 2006 2006-12-31 10.1002/smll.200500443 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:33:29.0032197 2019-03-18T14:33:28.7536120 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering Francis P. Gibbons 1 Alex P. G. Robinson 2 Richard E. Palmer 3 Mayanditheuar Manickam 4 Jon A. Preece 5 Richard Palmer 0000-0001-8728-8083 6
title Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography
spellingShingle Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography
Richard Palmer
title_short Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography
title_full Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography
title_fullStr Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography
title_full_unstemmed Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography
title_sort Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 Francis P. Gibbons
Alex P. G. Robinson
Richard E. Palmer
Mayanditheuar Manickam
Jon A. Preece
Richard Palmer
format Journal article
container_title Small
container_volume 2
container_issue 8-9
container_start_page 1003
publishDate 2006
institution Swansea University
issn 1613-6810
1613-6829
doi_str_mv 10.1002/smll.200500443
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
published_date 2006-12-31T04:00:18Z
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score 11.014358

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