Journal article 588 views
Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography
Francis P. Gibbons,
Alex P. G. Robinson,
Richard E. Palmer,
Mayanditheuar Manickam,
Jon A. Preece,
Richard Palmer
Small, Volume: 2, Issue: 8-9, Pages: 1003 - 1006
Swansea University Author: Richard Palmer
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DOI (Published version): 10.1002/smll.200500443
Abstract
Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography
Published in: | Small |
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ISSN: | 1613-6810 1613-6829 |
Published: |
2006
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URI: | https://cronfa.swan.ac.uk/Record/cronfa49363 |
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2019-03-18T14:33:29.0032197 v2 49363 2019-03-18 Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Journal Article Small 2 8-9 1003 1006 1613-6810 1613-6829 31 12 2006 2006-12-31 10.1002/smll.200500443 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:33:29.0032197 2019-03-18T14:33:28.7536120 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering Francis P. Gibbons 1 Alex P. G. Robinson 2 Richard E. Palmer 3 Mayanditheuar Manickam 4 Jon A. Preece 5 Richard Palmer 0000-0001-8728-8083 6 |
title |
Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography |
spellingShingle |
Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography Richard Palmer |
title_short |
Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography |
title_full |
Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography |
title_fullStr |
Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography |
title_full_unstemmed |
Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography |
title_sort |
Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography |
author_id_str_mv |
6ae369618efc7424d9774377536ea519 |
author_id_fullname_str_mv |
6ae369618efc7424d9774377536ea519_***_Richard Palmer |
author |
Richard Palmer |
author2 |
Francis P. Gibbons Alex P. G. Robinson Richard E. Palmer Mayanditheuar Manickam Jon A. Preece Richard Palmer |
format |
Journal article |
container_title |
Small |
container_volume |
2 |
container_issue |
8-9 |
container_start_page |
1003 |
publishDate |
2006 |
institution |
Swansea University |
issn |
1613-6810 1613-6829 |
doi_str_mv |
10.1002/smll.200500443 |
college_str |
Faculty of Science and Engineering |
hierarchytype |
|
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facultyofscienceandengineering |
hierarchy_top_title |
Faculty of Science and Engineering |
hierarchy_parent_id |
facultyofscienceandengineering |
hierarchy_parent_title |
Faculty of Science and Engineering |
department_str |
School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering |
document_store_str |
0 |
active_str |
0 |
published_date |
2006-12-31T04:00:18Z |
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1763753086256414720 |
score |
11.037056 |