Journal article 759 views
Chemically amplified molecular resists for e-beam lithography
F.P. Gibbons,
J. Manyam,
S. Diegoli,
M. Manickam,
J.A. Preece,
R.E. Palmer,
A.P.G. Robinson,
Richard Palmer 
Microelectronic Engineering, Volume: 85, Issue: 5-6, Pages: 764 - 767
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1016/j.mee.2007.12.001
Abstract
Chemically amplified molecular resists for e-beam lithography
| Published in: | Microelectronic Engineering |
|---|---|
| ISSN: | 01679317 |
| Published: |
2008
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| Online Access: |
Check full text
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49326 |
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| College: |
Faculty of Science and Engineering |
|---|---|
| Issue: |
5-6 |
| Start Page: |
764 |
| End Page: |
767 |