No Cover Image

Journal article 660 views

Chemically amplified molecular resists for e-beam lithography

F.P. Gibbons, J. Manyam, S. Diegoli, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson, Richard Palmer Orcid Logo

Microelectronic Engineering, Volume: 85, Issue: 5-6, Pages: 764 - 767

Swansea University Author: Richard Palmer Orcid Logo

Full text not available from this repository: check for access using links below.

Check full text

DOI (Published version): 10.1016/j.mee.2007.12.001

Published in: Microelectronic Engineering
ISSN: 01679317
Published: 2008
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa49326
Tags: Add Tag
No Tags, Be the first to tag this record!
first_indexed 2019-03-18T20:01:39Z
last_indexed 2019-03-18T20:01:39Z
id cronfa49326
recordtype SURis
fullrecord <?xml version="1.0"?><rfc1807><datestamp>2019-03-18T14:32:08.4287609</datestamp><bib-version>v2</bib-version><id>49326</id><entry>2019-03-18</entry><title>Chemically amplified molecular resists for e-beam lithography</title><swanseaauthors><author><sid>6ae369618efc7424d9774377536ea519</sid><ORCID>0000-0001-8728-8083</ORCID><firstname>Richard</firstname><surname>Palmer</surname><name>Richard Palmer</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2019-03-18</date><deptcode>MECH</deptcode><abstract/><type>Journal Article</type><journal>Microelectronic Engineering</journal><volume>85</volume><journalNumber>5-6</journalNumber><paginationStart>764</paginationStart><paginationEnd>767</paginationEnd><publisher/><placeOfPublication/><isbnPrint/><isbnElectronic/><issnPrint>01679317</issnPrint><issnElectronic/><keywords/><publishedDay>31</publishedDay><publishedMonth>12</publishedMonth><publishedYear>2008</publishedYear><publishedDate>2008-12-31</publishedDate><doi>10.1016/j.mee.2007.12.001</doi><url/><notes/><college>COLLEGE NANME</college><department>Mechanical Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>MECH</DepartmentCode><institution>Swansea University</institution><apcterm/><lastEdited>2019-03-18T14:32:08.4287609</lastEdited><Created>2019-03-18T14:32:08.1867172</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering</level></path><authors><author><firstname>F.P.</firstname><surname>Gibbons</surname><order>1</order></author><author><firstname>J.</firstname><surname>Manyam</surname><order>2</order></author><author><firstname>S.</firstname><surname>Diegoli</surname><order>3</order></author><author><firstname>M.</firstname><surname>Manickam</surname><order>4</order></author><author><firstname>J.A.</firstname><surname>Preece</surname><order>5</order></author><author><firstname>R.E.</firstname><surname>Palmer</surname><order>6</order></author><author><firstname>A.P.G.</firstname><surname>Robinson</surname><order>7</order></author><author><firstname>Richard</firstname><surname>Palmer</surname><orcid>0000-0001-8728-8083</orcid><order>8</order></author></authors><documents/><OutputDurs/></rfc1807>
spelling 2019-03-18T14:32:08.4287609 v2 49326 2019-03-18 Chemically amplified molecular resists for e-beam lithography 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Journal Article Microelectronic Engineering 85 5-6 764 767 01679317 31 12 2008 2008-12-31 10.1016/j.mee.2007.12.001 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:32:08.4287609 2019-03-18T14:32:08.1867172 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering F.P. Gibbons 1 J. Manyam 2 S. Diegoli 3 M. Manickam 4 J.A. Preece 5 R.E. Palmer 6 A.P.G. Robinson 7 Richard Palmer 0000-0001-8728-8083 8
title Chemically amplified molecular resists for e-beam lithography
spellingShingle Chemically amplified molecular resists for e-beam lithography
Richard Palmer
title_short Chemically amplified molecular resists for e-beam lithography
title_full Chemically amplified molecular resists for e-beam lithography
title_fullStr Chemically amplified molecular resists for e-beam lithography
title_full_unstemmed Chemically amplified molecular resists for e-beam lithography
title_sort Chemically amplified molecular resists for e-beam lithography
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 F.P. Gibbons
J. Manyam
S. Diegoli
M. Manickam
J.A. Preece
R.E. Palmer
A.P.G. Robinson
Richard Palmer
format Journal article
container_title Microelectronic Engineering
container_volume 85
container_issue 5-6
container_start_page 764
publishDate 2008
institution Swansea University
issn 01679317
doi_str_mv 10.1016/j.mee.2007.12.001
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
published_date 2008-12-31T04:00:14Z
_version_ 1763753081796820992
score 11.0133505

Similar Items