Palmer, R., Gibbons, F., Manyam, J., Diegoli, S., Manickam, M., Preece, J., . . . Robinson, A. (2008). Chemically amplified molecular resists for e-beam lithography. Microelectronic Engineering, 85(5-6), pp. 764-767. doi:10.1016/j.mee.2007.12.001

Palmer, Richard, F.P Gibbons, J. Manyam, S. Diegoli, M. Manickam, J.A Preece, R.E Palmer, and A.P.G Robinson. "Chemically Amplified Molecular Resists for E-beam Lithography." Microelectronic Engineering 85, no. 5-6 (2008): 764-767.

Palmer, Richard, et al. "Chemically Amplified Molecular Resists for E-beam Lithography." Microelectronic Engineering 85.5-6 (2008): 764-767.