Journal article 588 views
Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography
Francis P. Gibbons,
Alex P. G. Robinson,
Richard E. Palmer,
Mayanditheuar Manickam,
Jon A. Preece,
Richard Palmer 
Small, Volume: 2, Issue: 8-9, Pages: 1003 - 1006
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1002/smll.200500443
Abstract
Ultrathin Fullerene Films as High-Resolution Molecular Resists for Low-Voltage Electron-Beam Lithography
| Published in: | Small |
|---|---|
| ISSN: | 1613-6810 1613-6829 |
| Published: |
2006
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| Online Access: |
Check full text
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49363 |
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| College: |
Faculty of Science and Engineering |
|---|---|
| Issue: |
8-9 |
| Start Page: |
1003 |
| End Page: |
1006 |