Journal article 696 views
A high resolution water soluble fullerene molecular resist for electron beam lithography
X Chen,
R E Palmer,
A P G Robinson,
Richard Palmer 
Nanotechnology, Volume: 19, Issue: 27, Start page: 275308
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1088/0957-4484/19/27/275308
Abstract
A high resolution water soluble fullerene molecular resist for electron beam lithography
| Published in: | Nanotechnology |
|---|---|
| ISSN: | 0957-4484 1361-6528 |
| Published: |
2008
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| Online Access: |
Check full text
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49321 |
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| College: |
Faculty of Science and Engineering |
|---|---|
| Issue: |
27 |
| Start Page: |
275308 |