No Cover Image

Journal article 1033 views

A high resolution water soluble fullerene molecular resist for electron beam lithography

X Chen, R E Palmer, A P G Robinson, Richard Palmer Orcid Logo

Nanotechnology, Volume: 19, Issue: 27, Start page: 275308

Swansea University Author: Richard Palmer Orcid Logo

Full text not available from this repository: check for access using links below.

Check full text

DOI (Published version): 10.1088/0957-4484/19/27/275308

Published in: Nanotechnology
ISSN: 0957-4484 1361-6528
Published: 2008
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa49321
first_indexed 2019-03-18T20:01:39Z
last_indexed 2019-03-18T20:01:39Z
id cronfa49321
recordtype SURis
fullrecord <?xml version="1.0"?><rfc1807><datestamp>2019-03-18T14:32:02.5422301</datestamp><bib-version>v2</bib-version><id>49321</id><entry>2019-03-18</entry><title>A high resolution water soluble fullerene molecular resist for electron beam lithography</title><swanseaauthors><author><sid>6ae369618efc7424d9774377536ea519</sid><ORCID>0000-0001-8728-8083</ORCID><firstname>Richard</firstname><surname>Palmer</surname><name>Richard Palmer</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2019-03-18</date><deptcode>ACEM</deptcode><abstract/><type>Journal Article</type><journal>Nanotechnology</journal><volume>19</volume><journalNumber>27</journalNumber><paginationStart>275308</paginationStart><paginationEnd/><publisher/><placeOfPublication/><isbnPrint/><isbnElectronic/><issnPrint>0957-4484</issnPrint><issnElectronic>1361-6528</issnElectronic><keywords/><publishedDay>31</publishedDay><publishedMonth>12</publishedMonth><publishedYear>2008</publishedYear><publishedDate>2008-12-31</publishedDate><doi>10.1088/0957-4484/19/27/275308</doi><url/><notes/><college>COLLEGE NANME</college><department>Aerospace, Civil, Electrical, and Mechanical Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>ACEM</DepartmentCode><institution>Swansea University</institution><apcterm/><lastEdited>2019-03-18T14:32:02.5422301</lastEdited><Created>2019-03-18T14:32:02.3407485</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering</level></path><authors><author><firstname>X</firstname><surname>Chen</surname><order>1</order></author><author><firstname>R E</firstname><surname>Palmer</surname><order>2</order></author><author><firstname>A P G</firstname><surname>Robinson</surname><order>3</order></author><author><firstname>Richard</firstname><surname>Palmer</surname><orcid>0000-0001-8728-8083</orcid><order>4</order></author></authors><documents/><OutputDurs/></rfc1807>
spelling 2019-03-18T14:32:02.5422301 v2 49321 2019-03-18 A high resolution water soluble fullerene molecular resist for electron beam lithography 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 ACEM Journal Article Nanotechnology 19 27 275308 0957-4484 1361-6528 31 12 2008 2008-12-31 10.1088/0957-4484/19/27/275308 COLLEGE NANME Aerospace, Civil, Electrical, and Mechanical Engineering COLLEGE CODE ACEM Swansea University 2019-03-18T14:32:02.5422301 2019-03-18T14:32:02.3407485 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering X Chen 1 R E Palmer 2 A P G Robinson 3 Richard Palmer 0000-0001-8728-8083 4
title A high resolution water soluble fullerene molecular resist for electron beam lithography
spellingShingle A high resolution water soluble fullerene molecular resist for electron beam lithography
Richard Palmer
title_short A high resolution water soluble fullerene molecular resist for electron beam lithography
title_full A high resolution water soluble fullerene molecular resist for electron beam lithography
title_fullStr A high resolution water soluble fullerene molecular resist for electron beam lithography
title_full_unstemmed A high resolution water soluble fullerene molecular resist for electron beam lithography
title_sort A high resolution water soluble fullerene molecular resist for electron beam lithography
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 X Chen
R E Palmer
A P G Robinson
Richard Palmer
format Journal article
container_title Nanotechnology
container_volume 19
container_issue 27
container_start_page 275308
publishDate 2008
institution Swansea University
issn 0957-4484
1361-6528
doi_str_mv 10.1088/0957-4484/19/27/275308
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
published_date 2008-12-31T05:56:47Z
_version_ 1851280859066269696
score 11.090362

Similar Items