Palmer, R., Chen, X., Palmer, R. E., & Robinson, A. P. G. (2008). A high resolution water soluble fullerene molecular resist for electron beam lithography. Nanotechnology, 19(27), p. 275308. doi:10.1088/0957-4484/19/27/275308

Palmer, Richard, X. Chen, R E. Palmer, and A P G. Robinson. "A High Resolution Water Soluble Fullerene Molecular Resist for Electron Beam Lithography." Nanotechnology 19, no. 27 (2008): 275308.

Palmer, Richard, X. Chen, R E. Palmer, and A P G. Robinson. "A High Resolution Water Soluble Fullerene Molecular Resist for Electron Beam Lithography." Nanotechnology 19.27 (2008): 275308.