Journal article 623 views
Chemically amplified molecular resists for electron beam lithography
A.P.G. Robinson,
H.M. Zaid,
F.P. Gibbons,
R.E. Palmer,
M. Manickam,
J.A. Preece,
R. Brainard,
T. Zampini,
K. O’Connell,
Richard Palmer
Microelectronic Engineering, Volume: 83, Issue: 4-9, Pages: 1115 - 1118
Swansea University Author: Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1016/j.mee.2006.01.151
Abstract
Chemically amplified molecular resists for electron beam lithography
Published in: | Microelectronic Engineering |
---|---|
ISSN: | 01679317 |
Published: |
2006
|
Online Access: |
Check full text
|
URI: | https://cronfa.swan.ac.uk/Record/cronfa49350 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
first_indexed |
2019-03-18T20:01:43Z |
---|---|
last_indexed |
2019-03-18T20:01:43Z |
id |
cronfa49350 |
recordtype |
SURis |
fullrecord |
<?xml version="1.0"?><rfc1807><datestamp>2019-03-18T14:33:01.1018723</datestamp><bib-version>v2</bib-version><id>49350</id><entry>2019-03-18</entry><title>Chemically amplified molecular resists for electron beam lithography</title><swanseaauthors><author><sid>6ae369618efc7424d9774377536ea519</sid><ORCID>0000-0001-8728-8083</ORCID><firstname>Richard</firstname><surname>Palmer</surname><name>Richard Palmer</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2019-03-18</date><deptcode>MECH</deptcode><abstract/><type>Journal Article</type><journal>Microelectronic Engineering</journal><volume>83</volume><journalNumber>4-9</journalNumber><paginationStart>1115</paginationStart><paginationEnd>1118</paginationEnd><publisher/><placeOfPublication/><isbnPrint/><isbnElectronic/><issnPrint>01679317</issnPrint><issnElectronic/><keywords/><publishedDay>31</publishedDay><publishedMonth>12</publishedMonth><publishedYear>2006</publishedYear><publishedDate>2006-12-31</publishedDate><doi>10.1016/j.mee.2006.01.151</doi><url/><notes/><college>COLLEGE NANME</college><department>Mechanical Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>MECH</DepartmentCode><institution>Swansea University</institution><apcterm/><lastEdited>2019-03-18T14:33:01.1018723</lastEdited><Created>2019-03-18T14:33:00.8519106</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering</level></path><authors><author><firstname>A.P.G.</firstname><surname>Robinson</surname><order>1</order></author><author><firstname>H.M.</firstname><surname>Zaid</surname><order>2</order></author><author><firstname>F.P.</firstname><surname>Gibbons</surname><order>3</order></author><author><firstname>R.E.</firstname><surname>Palmer</surname><order>4</order></author><author><firstname>M.</firstname><surname>Manickam</surname><order>5</order></author><author><firstname>J.A.</firstname><surname>Preece</surname><order>6</order></author><author><firstname>R.</firstname><surname>Brainard</surname><order>7</order></author><author><firstname>T.</firstname><surname>Zampini</surname><order>8</order></author><author><firstname>K.</firstname><surname>O’Connell</surname><order>9</order></author><author><firstname>Richard</firstname><surname>Palmer</surname><orcid>0000-0001-8728-8083</orcid><order>10</order></author></authors><documents/><OutputDurs/></rfc1807> |
spelling |
2019-03-18T14:33:01.1018723 v2 49350 2019-03-18 Chemically amplified molecular resists for electron beam lithography 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Journal Article Microelectronic Engineering 83 4-9 1115 1118 01679317 31 12 2006 2006-12-31 10.1016/j.mee.2006.01.151 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:33:01.1018723 2019-03-18T14:33:00.8519106 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering A.P.G. Robinson 1 H.M. Zaid 2 F.P. Gibbons 3 R.E. Palmer 4 M. Manickam 5 J.A. Preece 6 R. Brainard 7 T. Zampini 8 K. O’Connell 9 Richard Palmer 0000-0001-8728-8083 10 |
title |
Chemically amplified molecular resists for electron beam lithography |
spellingShingle |
Chemically amplified molecular resists for electron beam lithography Richard Palmer |
title_short |
Chemically amplified molecular resists for electron beam lithography |
title_full |
Chemically amplified molecular resists for electron beam lithography |
title_fullStr |
Chemically amplified molecular resists for electron beam lithography |
title_full_unstemmed |
Chemically amplified molecular resists for electron beam lithography |
title_sort |
Chemically amplified molecular resists for electron beam lithography |
author_id_str_mv |
6ae369618efc7424d9774377536ea519 |
author_id_fullname_str_mv |
6ae369618efc7424d9774377536ea519_***_Richard Palmer |
author |
Richard Palmer |
author2 |
A.P.G. Robinson H.M. Zaid F.P. Gibbons R.E. Palmer M. Manickam J.A. Preece R. Brainard T. Zampini K. O’Connell Richard Palmer |
format |
Journal article |
container_title |
Microelectronic Engineering |
container_volume |
83 |
container_issue |
4-9 |
container_start_page |
1115 |
publishDate |
2006 |
institution |
Swansea University |
issn |
01679317 |
doi_str_mv |
10.1016/j.mee.2006.01.151 |
college_str |
Faculty of Science and Engineering |
hierarchytype |
|
hierarchy_top_id |
facultyofscienceandengineering |
hierarchy_top_title |
Faculty of Science and Engineering |
hierarchy_parent_id |
facultyofscienceandengineering |
hierarchy_parent_title |
Faculty of Science and Engineering |
department_str |
School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering |
document_store_str |
0 |
active_str |
0 |
published_date |
2006-12-31T04:00:17Z |
_version_ |
1763753084697182208 |
score |
11.037144 |