No Cover Image

Journal article 531 views

Chemically amplified molecular resists for electron beam lithography

A.P.G. Robinson, H.M. Zaid, F.P. Gibbons, R.E. Palmer, M. Manickam, J.A. Preece, R. Brainard, T. Zampini, K. O’Connell, Richard Palmer Orcid Logo

Microelectronic Engineering, Volume: 83, Issue: 4-9, Pages: 1115 - 1118

Swansea University Author: Richard Palmer Orcid Logo

Full text not available from this repository: check for access using links below.

Published in: Microelectronic Engineering
ISSN: 01679317
Published: 2006
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa49350
Tags: Add Tag
No Tags, Be the first to tag this record!
first_indexed 2019-03-18T20:01:43Z
last_indexed 2019-03-18T20:01:43Z
id cronfa49350
recordtype SURis
fullrecord <?xml version="1.0"?><rfc1807><datestamp>2019-03-18T14:33:01.1018723</datestamp><bib-version>v2</bib-version><id>49350</id><entry>2019-03-18</entry><title>Chemically amplified molecular resists for electron beam lithography</title><swanseaauthors><author><sid>6ae369618efc7424d9774377536ea519</sid><ORCID>0000-0001-8728-8083</ORCID><firstname>Richard</firstname><surname>Palmer</surname><name>Richard Palmer</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2019-03-18</date><deptcode>MECH</deptcode><abstract/><type>Journal Article</type><journal>Microelectronic Engineering</journal><volume>83</volume><journalNumber>4-9</journalNumber><paginationStart>1115</paginationStart><paginationEnd>1118</paginationEnd><publisher/><placeOfPublication/><isbnPrint/><isbnElectronic/><issnPrint>01679317</issnPrint><issnElectronic/><keywords/><publishedDay>31</publishedDay><publishedMonth>12</publishedMonth><publishedYear>2006</publishedYear><publishedDate>2006-12-31</publishedDate><doi>10.1016/j.mee.2006.01.151</doi><url/><notes/><college>COLLEGE NANME</college><department>Mechanical Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>MECH</DepartmentCode><institution>Swansea University</institution><apcterm/><lastEdited>2019-03-18T14:33:01.1018723</lastEdited><Created>2019-03-18T14:33:00.8519106</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering</level></path><authors><author><firstname>A.P.G.</firstname><surname>Robinson</surname><order>1</order></author><author><firstname>H.M.</firstname><surname>Zaid</surname><order>2</order></author><author><firstname>F.P.</firstname><surname>Gibbons</surname><order>3</order></author><author><firstname>R.E.</firstname><surname>Palmer</surname><order>4</order></author><author><firstname>M.</firstname><surname>Manickam</surname><order>5</order></author><author><firstname>J.A.</firstname><surname>Preece</surname><order>6</order></author><author><firstname>R.</firstname><surname>Brainard</surname><order>7</order></author><author><firstname>T.</firstname><surname>Zampini</surname><order>8</order></author><author><firstname>K.</firstname><surname>O&#x2019;Connell</surname><order>9</order></author><author><firstname>Richard</firstname><surname>Palmer</surname><orcid>0000-0001-8728-8083</orcid><order>10</order></author></authors><documents/><OutputDurs/></rfc1807>
spelling 2019-03-18T14:33:01.1018723 v2 49350 2019-03-18 Chemically amplified molecular resists for electron beam lithography 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Journal Article Microelectronic Engineering 83 4-9 1115 1118 01679317 31 12 2006 2006-12-31 10.1016/j.mee.2006.01.151 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:33:01.1018723 2019-03-18T14:33:00.8519106 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering A.P.G. Robinson 1 H.M. Zaid 2 F.P. Gibbons 3 R.E. Palmer 4 M. Manickam 5 J.A. Preece 6 R. Brainard 7 T. Zampini 8 K. O’Connell 9 Richard Palmer 0000-0001-8728-8083 10
title Chemically amplified molecular resists for electron beam lithography
spellingShingle Chemically amplified molecular resists for electron beam lithography
Richard Palmer
title_short Chemically amplified molecular resists for electron beam lithography
title_full Chemically amplified molecular resists for electron beam lithography
title_fullStr Chemically amplified molecular resists for electron beam lithography
title_full_unstemmed Chemically amplified molecular resists for electron beam lithography
title_sort Chemically amplified molecular resists for electron beam lithography
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 A.P.G. Robinson
H.M. Zaid
F.P. Gibbons
R.E. Palmer
M. Manickam
J.A. Preece
R. Brainard
T. Zampini
K. O’Connell
Richard Palmer
format Journal article
container_title Microelectronic Engineering
container_volume 83
container_issue 4-9
container_start_page 1115
publishDate 2006
institution Swansea University
issn 01679317
doi_str_mv 10.1016/j.mee.2006.01.151
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
published_date 2006-12-31T04:00:17Z
_version_ 1763753084697182208
score 11.013371