Palmer, R., Robinson, A., Zaid, H., Gibbons, F., Palmer, R., Manickam, M., . . . O’Connell, K. (2006). Chemically amplified molecular resists for electron beam lithography. Microelectronic Engineering, 83(4-9), pp. 1115-1118. doi:10.1016/j.mee.2006.01.151

Palmer, Richard, et al. "Chemically Amplified Molecular Resists for Electron Beam Lithography." Microelectronic Engineering 83, no. 4-9 (2006): 1115-1118.

Palmer, Richard, et al. "Chemically Amplified Molecular Resists for Electron Beam Lithography." Microelectronic Engineering 83.4-9 (2006): 1115-1118.