Journal article 1304 views
Quantum-Transport Study on the Impact of Channel Length and Cross Sections on Variability Induced by Random Discrete Dopants in Narrow Gate-All-Around Silicon Nanowire Transistors
Antonio Martinez,
Manuel Aldegunde,
Natalia Seoane,
Andrew R Brown,
John R Barker,
Asen Asenov,
Antonio Martinez Muniz
IEEE Transactions on Electron Devices, Volume: 58, Issue: 8, Pages: 2209 - 2217
Swansea University Author: Antonio Martinez Muniz
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DOI (Published version): 10.1109/ted.2011.2157929
Abstract
Quantum-Transport Study on the Impact of Channel Length and Cross Sections on Variability Induced by Random Discrete Dopants in Narrow Gate-All-Around Silicon Nanowire Transistors
Published in: | IEEE Transactions on Electron Devices |
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ISSN: | 0018-9383 1557-9646 |
Published: |
2011
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Online Access: |
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URI: | https://cronfa.swan.ac.uk/Record/cronfa10576 |
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Item Description: |
This paper was invited to appear in a special issue of IEEE Transactions on Electron Devices .The simulator developed in this work was used in the benchmarking of quantum transport simulators in the European NANOSIL project. Variability in device behavior due to random dopants and random realization of the Si/SiO2 interfaces are some of the critical problems affecting the miniaturization of CMOS devices. In this paper, the variability of extremely scaled nanowires has been evaluated for the first time, using a full quantum mechanical device simulator. |
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College: |
Faculty of Science and Engineering |
Issue: |
8 |
Start Page: |
2209 |
End Page: |
2217 |