Journal article 578 views
Plasma Etching of High-resolution Features in a Fullerene Molecular Resist
Robert D. Allen,
J. Manyam,
Mark H. Somervell,
M. Manickam,
J. A. Preece,
R. E. Palmer,
A. P. G. Robinson,
Richard Palmer 
Swansea University Author:
Richard Palmer
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DOI (Published version): 10.1117/12.879469
Abstract
Plasma Etching of High-resolution Features in a Fullerene Molecular Resist
| Published: |
2011
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49300 |
| College: |
Faculty of Science and Engineering |
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