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Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography

Andreas Frommhold, Dongxu Yang, Alexandra McClelland, Xiang Xue, Yasin Ekinci, Richard Palmer Orcid Logo, Alex P. G. Robinson

Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume: 12, Issue: 3, Start page: 033010

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1117/1.JMM.12.3.033010

Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS
ISSN: 1932-5150
Published: 2013
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa49273
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first_indexed 2019-03-18T20:01:32Z
last_indexed 2019-03-18T20:01:32Z
id cronfa49273
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spelling 2019-03-18T14:30:12.5103350 v2 49273 2019-03-18 Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Journal Article Journal of Micro/Nanolithography, MEMS, and MOEMS 12 3 033010 1932-5150 31 12 2013 2013-12-31 10.1117/1.JMM.12.3.033010 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:30:12.5103350 2019-03-18T14:30:12.2868804 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering Andreas Frommhold 1 Dongxu Yang 2 Alexandra McClelland 3 Xiang Xue 4 Yasin Ekinci 5 Richard Palmer 0000-0001-8728-8083 6 Alex P. G. Robinson 7
title Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography
spellingShingle Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography
Richard Palmer
title_short Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography
title_full Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography
title_fullStr Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography
title_full_unstemmed Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography
title_sort Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 Andreas Frommhold
Dongxu Yang
Alexandra McClelland
Xiang Xue
Yasin Ekinci
Richard Palmer
Alex P. G. Robinson
format Journal article
container_title Journal of Micro/Nanolithography, MEMS, and MOEMS
container_volume 12
container_issue 3
container_start_page 033010
publishDate 2013
institution Swansea University
issn 1932-5150
doi_str_mv 10.1117/1.JMM.12.3.033010
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
published_date 2013-12-31T04:00:08Z
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score 11.013619

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