Palmer, R., Frommhold, A., Yang, D., McClelland, A., Xue, X., Ekinci, Y., & Robinson, A. P. G. (2013). Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography. Journal of Micro/Nanolithography, MEMS, and MOEMS, 12(3), p. 033010. doi:10.1117/1.JMM.12.3.033010

Palmer, Richard, Andreas Frommhold, Dongxu Yang, Alexandra McClelland, Xiang Xue, Yasin Ekinci, and Alex P. G. Robinson. "Performance of Negative Tone Chemically Amplified Fullerene Resists in Extreme Ultraviolet Lithography." Journal of Micro/Nanolithography, MEMS, and MOEMS 12, no. 3 (2013): 033010.

Palmer, Richard, et al. "Performance of Negative Tone Chemically Amplified Fullerene Resists in Extreme Ultraviolet Lithography." Journal of Micro/Nanolithography, MEMS, and MOEMS 12.3 (2013): 033010.