Journal article 530 views
Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography
Thomas I. Wallow,
Christoph K. Hohle,
A. Frommhold,
D. X. Yang,
A. McClelland,
X. Xue,
Y. Ekinci,
R. E. Palmer,
A. P. G. Robinson,
Richard Palmer 
Swansea University Author:
Richard Palmer
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DOI (Published version): 10.1117/12.2046268
Abstract
Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography
| Published: |
2014
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49264 |
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| College: |
Faculty of Science and Engineering |
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