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Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography

Thomas I. Wallow, Christoph K. Hohle, A. Frommhold, D. X. Yang, A. McClelland, X. Xue, Y. Ekinci, R. E. Palmer, A. P. G. Robinson, Richard Palmer Orcid Logo

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1117/12.2046268

Published: 2014
URI: https://cronfa.swan.ac.uk/Record/cronfa49264
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first_indexed 2019-03-18T20:01:31Z
last_indexed 2019-03-18T20:01:31Z
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spelling 2019-03-18T14:29:50.0762621 v2 49264 2019-03-18 Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Journal Article 31 12 2014 2014-12-31 10.1117/12.2046268 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:29:50.0762621 2019-03-18T14:29:49.8687924 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering Thomas I. Wallow 1 Christoph K. Hohle 2 A. Frommhold 3 D. X. Yang 4 A. McClelland 5 X. Xue 6 Y. Ekinci 7 R. E. Palmer 8 A. P. G. Robinson 9 Richard Palmer 0000-0001-8728-8083 10
title Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography
spellingShingle Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography
Richard Palmer
title_short Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography
title_full Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography
title_fullStr Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography
title_full_unstemmed Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography
title_sort Optimization of Fullerene-based Negative tone Chemically Amplified Fullerene Resist for Extreme Ultraviolet Lithography
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 Thomas I. Wallow
Christoph K. Hohle
A. Frommhold
D. X. Yang
A. McClelland
X. Xue
Y. Ekinci
R. E. Palmer
A. P. G. Robinson
Richard Palmer
format Journal article
publishDate 2014
institution Swansea University
doi_str_mv 10.1117/12.2046268
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
published_date 2014-12-31T04:00:07Z
_version_ 1763753074275385344
score 11.013686

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