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Strain-Reduction Induced Rise in Channel Temperature at Ohmic Contacts of GaN HEMTs
Steven J. Duffy,
Brahim Benbakhti,
Karol Kalna ,
Mohammed Boucherta,
Wei D. Zhang,
Nour E. Bourzgui,
Ali Soltani
IEEE Access, Volume: 6, Pages: 42721 - 42728
Swansea University Author: Karol Kalna
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DOI (Published version): 10.1109/ACCESS.2018.2861323
Abstract
Temperature distributions in AlGaN$/$GaN TLM structures and devices are characterized and analysed using Infrascope temperature mapping system. For the first time, a substantial rise of channel temperature at the inner ends of Ohmic contacts has been observed. The X-ray diffraction technique combine...
Published in: | IEEE Access |
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ISSN: | 2169-3536 |
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2018
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URI: | https://cronfa.swan.ac.uk/Record/cronfa44608 |
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2018-10-09T11:38:24.9998331 v2 44608 2018-09-26 Strain-Reduction Induced Rise in Channel Temperature at Ohmic Contacts of GaN HEMTs 1329a42020e44fdd13de2f20d5143253 0000-0002-6333-9189 Karol Kalna Karol Kalna true false 2018-09-26 EEEG Temperature distributions in AlGaN$/$GaN TLM structures and devices are characterized and analysed using Infrascope temperature mapping system. For the first time, a substantial rise of channel temperature at the inner ends of Ohmic contacts has been observed. The X-ray diffraction technique combined with drift-diffusion simulations show that reduction in a strain at the vicinity of Ohmic contacts increases electric field at these locations resulting in the rise of lattice temperature. The thermal coupling of a high conductive tensile region at the contacts to a low conductive channel region is an origin of the temperature rise observed in both short and long channel structures and devices. Journal Article IEEE Access 6 42721 42728 2169-3536 20 8 2018 2018-08-20 10.1109/ACCESS.2018.2861323 COLLEGE NANME Electronic and Electrical Engineering COLLEGE CODE EEEG Swansea University 2018-10-09T11:38:24.9998331 2018-09-26T09:56:57.4993757 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Electronic and Electrical Engineering Steven J. Duffy 1 Brahim Benbakhti 2 Karol Kalna 0000-0002-6333-9189 3 Mohammed Boucherta 4 Wei D. Zhang 5 Nour E. Bourzgui 6 Ali Soltani 7 0044608-08102018143938.pdf duffy2018(3).pdf 2018-10-08T14:39:38.5670000 Output 10006522 application/pdf Version of Record true 2018-10-08T00:00:00.0000000 true eng |
title |
Strain-Reduction Induced Rise in Channel Temperature at Ohmic Contacts of GaN HEMTs |
spellingShingle |
Strain-Reduction Induced Rise in Channel Temperature at Ohmic Contacts of GaN HEMTs Karol Kalna |
title_short |
Strain-Reduction Induced Rise in Channel Temperature at Ohmic Contacts of GaN HEMTs |
title_full |
Strain-Reduction Induced Rise in Channel Temperature at Ohmic Contacts of GaN HEMTs |
title_fullStr |
Strain-Reduction Induced Rise in Channel Temperature at Ohmic Contacts of GaN HEMTs |
title_full_unstemmed |
Strain-Reduction Induced Rise in Channel Temperature at Ohmic Contacts of GaN HEMTs |
title_sort |
Strain-Reduction Induced Rise in Channel Temperature at Ohmic Contacts of GaN HEMTs |
author_id_str_mv |
1329a42020e44fdd13de2f20d5143253 |
author_id_fullname_str_mv |
1329a42020e44fdd13de2f20d5143253_***_Karol Kalna |
author |
Karol Kalna |
author2 |
Steven J. Duffy Brahim Benbakhti Karol Kalna Mohammed Boucherta Wei D. Zhang Nour E. Bourzgui Ali Soltani |
format |
Journal article |
container_title |
IEEE Access |
container_volume |
6 |
container_start_page |
42721 |
publishDate |
2018 |
institution |
Swansea University |
issn |
2169-3536 |
doi_str_mv |
10.1109/ACCESS.2018.2861323 |
college_str |
Faculty of Science and Engineering |
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facultyofscienceandengineering |
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Faculty of Science and Engineering |
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facultyofscienceandengineering |
hierarchy_parent_title |
Faculty of Science and Engineering |
department_str |
School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Electronic and Electrical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Electronic and Electrical Engineering |
document_store_str |
1 |
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description |
Temperature distributions in AlGaN$/$GaN TLM structures and devices are characterized and analysed using Infrascope temperature mapping system. For the first time, a substantial rise of channel temperature at the inner ends of Ohmic contacts has been observed. The X-ray diffraction technique combined with drift-diffusion simulations show that reduction in a strain at the vicinity of Ohmic contacts increases electric field at these locations resulting in the rise of lattice temperature. The thermal coupling of a high conductive tensile region at the contacts to a low conductive channel region is an origin of the temperature rise observed in both short and long channel structures and devices. |
published_date |
2018-08-20T03:55:54Z |
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1763752808635432960 |
score |
11.037581 |