Search: '"Microelectronic Engineering"'

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Swansea University Author: Karol Kalna
Published in Microelectronic Engineering (2009)
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Swansea University Author: Karol Kalna
Published in Microelectronic Engineering (2011)
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Swansea University Author: Yuzheng Guo
Published in Microelectronic Engineering (2017)
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Performance of a high resolution chemically amplified electron beam resist at various beam energies / D.X. Yang, A. Frommhold, A. McClelland, J. Roth, M. Rosamond, et al

Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2016)
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Swansea University Author: Yuzheng Guo
Published in Microelectronic Engineering (2019)
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Fullerene-based spin-on-carbon hardmask / A. Frommhold, J. Manyam, R.E. Palmer, A.P.G. Robinson

Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2012)
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Anomalous acid diffusion in a triphenylene molecular resist with melamine crosslinker / H.M. Zaid, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson

Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2008)
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Chemically amplified molecular resists for e-beam lithography / F.P. Gibbons, J. Manyam, S. Diegoli, M. Manickam, J.A. Preece, et al

Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2008)
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Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2002)
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Electron beam lithography in passivated gold nanoclusters / T.R. Bedson, R.E. Palmer, J.P. Wilcoxon

Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2001)
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Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2001)
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A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution / T. Tada, T. Kanayama, A.P.G. Robinson, R.E. Palmer, M.T. Allen, et al

Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2000)
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Direct electron beam writing of nanostructures using passivated gold clusters / T.R. Bedson, P.D. Nellist, R.E. Palmer, J.P. Wilcoxon

Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2000)
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Fabrication of 10-nm Si pillars with self-formed etching masks / Tetsuya Tada, Toshihiko Kanayama, Pascal Weibel, Simon J. Carroll, Katrin Seeger

Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (1997)
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Chemically amplified molecular resists for electron beam lithography / A.P.G. Robinson, H.M. Zaid, F.P. Gibbons, R.E. Palmer, M. Manickam, et al

Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2006)
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Swansea University Author: Richard Palmer
Published in Microelectronic Engineering (2004)
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Swansea University Author: Yuzheng Guo
Published in Microelectronic Engineering (2019)
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