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Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells
Surface and Coatings Technology, Volume: 385, Start page: 125423
Swansea University Authors: Simone Meroni , Trystan Watson
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DOI (Published version): 10.1016/j.surfcoat.2020.125423
Abstract
Thin films of polycrystalline NiO were deposited by Flame Assisted Chemical Vapour Deposition, which is an ideal process for in-line, atmospheric pressure deposition of wide area coatings. This, along with the ability to use aqueous salts rather than organic precursors or solvents makes it well suit...
Published in: | Surface and Coatings Technology |
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ISSN: | 0257-8972 |
Published: |
Elsevier BV
2020
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URI: | https://cronfa.swan.ac.uk/Record/cronfa53383 |
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2020-09-17T03:16:37Z |
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2020-01-29T10:32:46.0480078 v2 53383 2020-01-29 Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells 78a4cf80ab2fe6cca80716b5d357d8dd 0000-0002-6901-772X Simone Meroni Simone Meroni true false a210327b52472cfe8df9b8108d661457 0000-0002-8015-1436 Trystan Watson Trystan Watson true false 2020-01-29 EAAS Thin films of polycrystalline NiO were deposited by Flame Assisted Chemical Vapour Deposition, which is an ideal process for in-line, atmospheric pressure deposition of wide area coatings. This, along with the ability to use aqueous salts rather than organic precursors or solvents makes it well suited for industrial integration. To establish the capability of FACVD deposited NiO for use as a low cost, commercially viable option planar perovskite cells were fabricated under ambient conditions. The resulting cells showed the importance of both the flame composition and NiO thickness. A continuous NiO Hole Transport Layer (HTL) was achieved for ca. 36 nm thick film, which showed a maximum higher efficiency of 12.3% over that of the control (11.8%) which used a spin coated HTL. This was mainly driven by the large improvement in the current density from 16.6 mA/cm2 to 19.0 mA/cm2. Journal Article Surface and Coatings Technology 385 125423 Elsevier BV 0257-8972 FACVD; CVD; NiO; Perovskite; Hole transport 15 3 2020 2020-03-15 10.1016/j.surfcoat.2020.125423 COLLEGE NANME Engineering and Applied Sciences School COLLEGE CODE EAAS Swansea University 2020-01-29T10:32:46.0480078 2020-01-29T10:32:46.0480078 Heather M. Yates 1 John L. Hodgkinson 2 Simone Meroni 0000-0002-6901-772X 3 David Richards 4 Trystan Watson 0000-0002-8015-1436 5 53383__16531__b2a0a16871f14ce3bc3e1a0119de2186.pdf 53383.pdf 2020-02-04T16:18:33.4204206 Output 4259726 application/pdf Accepted Manuscript true 2021-01-28T00:00:00.0000000 Released under the terms of a Creative Commons Attribution Non-Commercial No Derivatives License (CC-BY-NC-ND). true eng |
title |
Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells |
spellingShingle |
Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells Simone Meroni Trystan Watson |
title_short |
Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells |
title_full |
Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells |
title_fullStr |
Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells |
title_full_unstemmed |
Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells |
title_sort |
Flame Assisted Chemical Vapour Deposition of NiO hole transport layers for planar perovskite cells |
author_id_str_mv |
78a4cf80ab2fe6cca80716b5d357d8dd a210327b52472cfe8df9b8108d661457 |
author_id_fullname_str_mv |
78a4cf80ab2fe6cca80716b5d357d8dd_***_Simone Meroni a210327b52472cfe8df9b8108d661457_***_Trystan Watson |
author |
Simone Meroni Trystan Watson |
author2 |
Heather M. Yates John L. Hodgkinson Simone Meroni David Richards Trystan Watson |
format |
Journal article |
container_title |
Surface and Coatings Technology |
container_volume |
385 |
container_start_page |
125423 |
publishDate |
2020 |
institution |
Swansea University |
issn |
0257-8972 |
doi_str_mv |
10.1016/j.surfcoat.2020.125423 |
publisher |
Elsevier BV |
document_store_str |
1 |
active_str |
0 |
description |
Thin films of polycrystalline NiO were deposited by Flame Assisted Chemical Vapour Deposition, which is an ideal process for in-line, atmospheric pressure deposition of wide area coatings. This, along with the ability to use aqueous salts rather than organic precursors or solvents makes it well suited for industrial integration. To establish the capability of FACVD deposited NiO for use as a low cost, commercially viable option planar perovskite cells were fabricated under ambient conditions. The resulting cells showed the importance of both the flame composition and NiO thickness. A continuous NiO Hole Transport Layer (HTL) was achieved for ca. 36 nm thick film, which showed a maximum higher efficiency of 12.3% over that of the control (11.8%) which used a spin coated HTL. This was mainly driven by the large improvement in the current density from 16.6 mA/cm2 to 19.0 mA/cm2. |
published_date |
2020-03-15T07:52:03Z |
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1821391112295677952 |
score |
11.364387 |