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Electron Beam Lithography and Plasma Etching To Fabricate Supports for Studying Nanomaterials

Mona Alyobi, Richard Cobley Orcid Logo

International Journal of Research in Science, Volume: 3, Issue: 2, Start page: 18

Swansea University Author: Richard Cobley Orcid Logo

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DOI (Published version): 10.24178/ijrs.2017.3.2.18

Published in: International Journal of Research in Science
ISSN: 2412-4389
Published: Research Plus Journals 2017
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URI: https://cronfa.swan.ac.uk/Record/cronfa52760
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first_indexed 2020-12-14T15:58:27Z
last_indexed 2023-03-18T04:05:51Z
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fullrecord <?xml version="1.0"?><rfc1807><datestamp>2023-03-17T15:14:36.3078559</datestamp><bib-version>v2</bib-version><id>52760</id><entry>2019-11-16</entry><title>Electron Beam Lithography and Plasma Etching To Fabricate Supports for Studying Nanomaterials</title><swanseaauthors><author><sid>2ce7e1dd9006164425415a35fa452494</sid><ORCID>0000-0003-4833-8492</ORCID><firstname>Richard</firstname><surname>Cobley</surname><name>Richard Cobley</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2019-11-16</date><deptcode>EEEG</deptcode><abstract/><type>Journal Article</type><journal>International Journal of Research in Science</journal><volume>3</volume><journalNumber>2</journalNumber><paginationStart>18</paginationStart><paginationEnd/><publisher>Research Plus Journals</publisher><placeOfPublication/><isbnPrint/><isbnElectronic/><issnPrint/><issnElectronic>2412-4389</issnElectronic><keywords/><publishedDay>24</publishedDay><publishedMonth>6</publishedMonth><publishedYear>2017</publishedYear><publishedDate>2017-06-24</publishedDate><doi>10.24178/ijrs.2017.3.2.18</doi><url/><notes/><college>COLLEGE NANME</college><department>Electronic and Electrical Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>EEEG</DepartmentCode><institution>Swansea University</institution><apcterm/><funders/><projectreference/><lastEdited>2023-03-17T15:14:36.3078559</lastEdited><Created>2019-11-16T12:46:06.4501424</Created><path><level id="1">Professional Services</level><level id="2"/></path><authors><author><firstname>Mona</firstname><surname>Alyobi</surname><order>1</order></author><author><firstname>Richard</firstname><surname>Cobley</surname><orcid>0000-0003-4833-8492</orcid><order>2</order></author></authors><documents><document><filename>52760__18883__a539ba472df6453cabe734d53d111e9b.pdf</filename><originalFilename>52760.pdf</originalFilename><uploaded>2020-12-14T15:57:47.8597732</uploaded><type>Output</type><contentLength>132644</contentLength><contentType>application/pdf</contentType><version>Version of Record</version><cronfaStatus>true</cronfaStatus><documentNotes>This work is licensed under a Creative Commons Attribution-ShareAlike 4.0 International License.</documentNotes><copyrightCorrect>true</copyrightCorrect><language>eng</language><licence>https://creativecommons.org/licenses/by-sa/4.0/</licence></document></documents><OutputDurs/></rfc1807>
spelling 2023-03-17T15:14:36.3078559 v2 52760 2019-11-16 Electron Beam Lithography and Plasma Etching To Fabricate Supports for Studying Nanomaterials 2ce7e1dd9006164425415a35fa452494 0000-0003-4833-8492 Richard Cobley Richard Cobley true false 2019-11-16 EEEG Journal Article International Journal of Research in Science 3 2 18 Research Plus Journals 2412-4389 24 6 2017 2017-06-24 10.24178/ijrs.2017.3.2.18 COLLEGE NANME Electronic and Electrical Engineering COLLEGE CODE EEEG Swansea University 2023-03-17T15:14:36.3078559 2019-11-16T12:46:06.4501424 Professional Services Mona Alyobi 1 Richard Cobley 0000-0003-4833-8492 2 52760__18883__a539ba472df6453cabe734d53d111e9b.pdf 52760.pdf 2020-12-14T15:57:47.8597732 Output 132644 application/pdf Version of Record true This work is licensed under a Creative Commons Attribution-ShareAlike 4.0 International License. true eng https://creativecommons.org/licenses/by-sa/4.0/
title Electron Beam Lithography and Plasma Etching To Fabricate Supports for Studying Nanomaterials
spellingShingle Electron Beam Lithography and Plasma Etching To Fabricate Supports for Studying Nanomaterials
Richard Cobley
title_short Electron Beam Lithography and Plasma Etching To Fabricate Supports for Studying Nanomaterials
title_full Electron Beam Lithography and Plasma Etching To Fabricate Supports for Studying Nanomaterials
title_fullStr Electron Beam Lithography and Plasma Etching To Fabricate Supports for Studying Nanomaterials
title_full_unstemmed Electron Beam Lithography and Plasma Etching To Fabricate Supports for Studying Nanomaterials
title_sort Electron Beam Lithography and Plasma Etching To Fabricate Supports for Studying Nanomaterials
author_id_str_mv 2ce7e1dd9006164425415a35fa452494
author_id_fullname_str_mv 2ce7e1dd9006164425415a35fa452494_***_Richard Cobley
author Richard Cobley
author2 Mona Alyobi
Richard Cobley
format Journal article
container_title International Journal of Research in Science
container_volume 3
container_issue 2
container_start_page 18
publishDate 2017
institution Swansea University
issn 2412-4389
doi_str_mv 10.24178/ijrs.2017.3.2.18
publisher Research Plus Journals
college_str Professional Services
hierarchytype
hierarchy_top_id professionalservices
hierarchy_top_title Professional Services
hierarchy_parent_id professionalservices
hierarchy_parent_title Professional Services
document_store_str 1
active_str 0
published_date 2017-06-24T04:05:19Z
_version_ 1763753401431097344
score 10.998093

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