Journal article 903 views
Nano-machining of films deposited on H-passivated Si(111)
Journal of Physics D: Applied Physics, Volume: 30, Issue: 24, Pages: 3307 - 3311
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1088/0022-3727/30/24/007
Abstract
Nano-machining of films deposited on H-passivated Si(111)
| Published in: | Journal of Physics D: Applied Physics |
|---|---|
| ISSN: | 0022-3727 1361-6463 |
| Published: |
1997
|
| Online Access: |
Check full text
|
| URI: | https://cronfa.swan.ac.uk/Record/cronfa49511 |
| first_indexed |
2019-03-18T20:02:05Z |
|---|---|
| last_indexed |
2019-03-18T20:02:05Z |
| id |
cronfa49511 |
| recordtype |
SURis |
| fullrecord |
<?xml version="1.0"?><rfc1807><datestamp>2019-03-18T14:38:50.8723494</datestamp><bib-version>v2</bib-version><id>49511</id><entry>2019-03-18</entry><title>Nano-machining of films deposited on H-passivated Si(111)</title><swanseaauthors><author><sid>6ae369618efc7424d9774377536ea519</sid><ORCID>0000-0001-8728-8083</ORCID><firstname>Richard</firstname><surname>Palmer</surname><name>Richard Palmer</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2019-03-18</date><deptcode>ACEM</deptcode><abstract/><type>Journal Article</type><journal>Journal of Physics D: Applied Physics</journal><volume>30</volume><journalNumber>24</journalNumber><paginationStart>3307</paginationStart><paginationEnd>3311</paginationEnd><publisher/><placeOfPublication/><isbnPrint/><isbnElectronic/><issnPrint>0022-3727</issnPrint><issnElectronic>1361-6463</issnElectronic><keywords/><publishedDay>31</publishedDay><publishedMonth>12</publishedMonth><publishedYear>1997</publishedYear><publishedDate>1997-12-31</publishedDate><doi>10.1088/0022-3727/30/24/007</doi><url/><notes/><college>COLLEGE NANME</college><department>Aerospace, Civil, Electrical, and Mechanical Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>ACEM</DepartmentCode><institution>Swansea University</institution><apcterm/><lastEdited>2019-03-18T14:38:50.8723494</lastEdited><Created>2019-03-18T14:38:50.6709230</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering</level></path><authors><author><firstname>P</firstname><surname>Miao</surname><order>1</order></author><author><firstname>A W</firstname><surname>Robinson</surname><order>2</order></author><author><firstname>R E</firstname><surname>Palmer</surname><order>3</order></author><author><firstname>Richard</firstname><surname>Palmer</surname><orcid>0000-0001-8728-8083</orcid><order>4</order></author></authors><documents/><OutputDurs/></rfc1807> |
| spelling |
2019-03-18T14:38:50.8723494 v2 49511 2019-03-18 Nano-machining of films deposited on H-passivated Si(111) 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 ACEM Journal Article Journal of Physics D: Applied Physics 30 24 3307 3311 0022-3727 1361-6463 31 12 1997 1997-12-31 10.1088/0022-3727/30/24/007 COLLEGE NANME Aerospace, Civil, Electrical, and Mechanical Engineering COLLEGE CODE ACEM Swansea University 2019-03-18T14:38:50.8723494 2019-03-18T14:38:50.6709230 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering P Miao 1 A W Robinson 2 R E Palmer 3 Richard Palmer 0000-0001-8728-8083 4 |
| title |
Nano-machining of films deposited on H-passivated Si(111) |
| spellingShingle |
Nano-machining of films deposited on H-passivated Si(111) Richard Palmer |
| title_short |
Nano-machining of films deposited on H-passivated Si(111) |
| title_full |
Nano-machining of films deposited on H-passivated Si(111) |
| title_fullStr |
Nano-machining of films deposited on H-passivated Si(111) |
| title_full_unstemmed |
Nano-machining of films deposited on H-passivated Si(111) |
| title_sort |
Nano-machining of films deposited on H-passivated Si(111) |
| author_id_str_mv |
6ae369618efc7424d9774377536ea519 |
| author_id_fullname_str_mv |
6ae369618efc7424d9774377536ea519_***_Richard Palmer |
| author |
Richard Palmer |
| author2 |
P Miao A W Robinson R E Palmer Richard Palmer |
| format |
Journal article |
| container_title |
Journal of Physics D: Applied Physics |
| container_volume |
30 |
| container_issue |
24 |
| container_start_page |
3307 |
| publishDate |
1997 |
| institution |
Swansea University |
| issn |
0022-3727 1361-6463 |
| doi_str_mv |
10.1088/0022-3727/30/24/007 |
| college_str |
Faculty of Science and Engineering |
| hierarchytype |
|
| hierarchy_top_id |
facultyofscienceandengineering |
| hierarchy_top_title |
Faculty of Science and Engineering |
| hierarchy_parent_id |
facultyofscienceandengineering |
| hierarchy_parent_title |
Faculty of Science and Engineering |
| department_str |
School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering |
| document_store_str |
0 |
| active_str |
0 |
| published_date |
1997-12-31T04:33:50Z |
| _version_ |
1851547430661652480 |
| score |
11.090071 |

