No Cover Image

Journal article 503 views

Fabrication of silicon cones and pillars using rough metal films as plasma etching masks

K. Seeger, R. E. Palmer, Richard Palmer Orcid Logo

Applied Physics Letters, Volume: 74, Issue: 11, Pages: 1627 - 1629

Swansea University Author: Richard Palmer Orcid Logo

Full text not available from this repository: check for access using links below.

Check full text

DOI (Published version): 10.1063/1.123638

Published in: Applied Physics Letters
ISSN: 0003-6951 1077-3118
Published: 1999
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa49471
Tags: Add Tag
No Tags, Be the first to tag this record!
first_indexed 2019-03-18T20:01:59Z
last_indexed 2019-03-18T20:01:59Z
id cronfa49471
recordtype SURis
fullrecord <?xml version="1.0"?><rfc1807><datestamp>2019-03-18T14:37:12.1532710</datestamp><bib-version>v2</bib-version><id>49471</id><entry>2019-03-18</entry><title>Fabrication of silicon cones and pillars using rough metal films as plasma etching masks</title><swanseaauthors><author><sid>6ae369618efc7424d9774377536ea519</sid><ORCID>0000-0001-8728-8083</ORCID><firstname>Richard</firstname><surname>Palmer</surname><name>Richard Palmer</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2019-03-18</date><deptcode>MECH</deptcode><abstract/><type>Journal Article</type><journal>Applied Physics Letters</journal><volume>74</volume><journalNumber>11</journalNumber><paginationStart>1627</paginationStart><paginationEnd>1629</paginationEnd><publisher/><placeOfPublication/><isbnPrint/><isbnElectronic/><issnPrint>0003-6951</issnPrint><issnElectronic>1077-3118</issnElectronic><keywords/><publishedDay>31</publishedDay><publishedMonth>12</publishedMonth><publishedYear>1999</publishedYear><publishedDate>1999-12-31</publishedDate><doi>10.1063/1.123638</doi><url/><notes/><college>COLLEGE NANME</college><department>Mechanical Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>MECH</DepartmentCode><institution>Swansea University</institution><apcterm/><lastEdited>2019-03-18T14:37:12.1532710</lastEdited><Created>2019-03-18T14:37:11.9101589</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering</level></path><authors><author><firstname>K.</firstname><surname>Seeger</surname><order>1</order></author><author><firstname>R. E.</firstname><surname>Palmer</surname><order>2</order></author><author><firstname>Richard</firstname><surname>Palmer</surname><orcid>0000-0001-8728-8083</orcid><order>3</order></author></authors><documents/><OutputDurs/></rfc1807>
spelling 2019-03-18T14:37:12.1532710 v2 49471 2019-03-18 Fabrication of silicon cones and pillars using rough metal films as plasma etching masks 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Journal Article Applied Physics Letters 74 11 1627 1629 0003-6951 1077-3118 31 12 1999 1999-12-31 10.1063/1.123638 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:37:12.1532710 2019-03-18T14:37:11.9101589 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering K. Seeger 1 R. E. Palmer 2 Richard Palmer 0000-0001-8728-8083 3
title Fabrication of silicon cones and pillars using rough metal films as plasma etching masks
spellingShingle Fabrication of silicon cones and pillars using rough metal films as plasma etching masks
Richard Palmer
title_short Fabrication of silicon cones and pillars using rough metal films as plasma etching masks
title_full Fabrication of silicon cones and pillars using rough metal films as plasma etching masks
title_fullStr Fabrication of silicon cones and pillars using rough metal films as plasma etching masks
title_full_unstemmed Fabrication of silicon cones and pillars using rough metal films as plasma etching masks
title_sort Fabrication of silicon cones and pillars using rough metal films as plasma etching masks
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 K. Seeger
R. E. Palmer
Richard Palmer
format Journal article
container_title Applied Physics Letters
container_volume 74
container_issue 11
container_start_page 1627
publishDate 1999
institution Swansea University
issn 0003-6951
1077-3118
doi_str_mv 10.1063/1.123638
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
published_date 1999-12-31T04:00:31Z
_version_ 1763753099216814080
score 11.013148