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A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution

T. Tada, T. Kanayama, A.P.G. Robinson, R.E. Palmer, M.T. Allen, J.A. Preece, K.D.M. Harris, Richard Palmer Orcid Logo

Microelectronic Engineering, Volume: 53, Issue: 1-4, Pages: 425 - 428

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1016/s0167-9317(00)00348-8

Published in: Microelectronic Engineering
ISSN: 01679317
Published: 2000
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URI: https://cronfa.swan.ac.uk/Record/cronfa49442
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first_indexed 2019-03-18T20:01:55Z
last_indexed 2019-03-18T20:01:55Z
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spelling 2019-03-18T14:35:59.3446594 v2 49442 2019-03-18 A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 MECH Journal Article Microelectronic Engineering 53 1-4 425 428 01679317 31 12 2000 2000-12-31 10.1016/s0167-9317(00)00348-8 COLLEGE NANME Mechanical Engineering COLLEGE CODE MECH Swansea University 2019-03-18T14:35:59.3446594 2019-03-18T14:35:59.1354999 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering T. Tada 1 T. Kanayama 2 A.P.G. Robinson 3 R.E. Palmer 4 M.T. Allen 5 J.A. Preece 6 K.D.M. Harris 7 Richard Palmer 0000-0001-8728-8083 8
title A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution
spellingShingle A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution
Richard Palmer
title_short A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution
title_full A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution
title_fullStr A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution
title_full_unstemmed A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution
title_sort A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 T. Tada
T. Kanayama
A.P.G. Robinson
R.E. Palmer
M.T. Allen
J.A. Preece
K.D.M. Harris
Richard Palmer
format Journal article
container_title Microelectronic Engineering
container_volume 53
container_issue 1-4
container_start_page 425
publishDate 2000
institution Swansea University
issn 01679317
doi_str_mv 10.1016/s0167-9317(00)00348-8
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
published_date 2000-12-31T04:00:27Z
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score 11.013619

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