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Journal article 1376 views 261 downloads

Surface sensitivity of four-probe STM resistivity measurements of bulk ZnO correlated to XPS

Alex Lord Orcid Logo, Jonathan E Evans, Chris J Barnett, Martin W Allen, Andrew Barron Orcid Logo, Steve P Wilks

Journal of Physics: Condensed Matter, Volume: 29, Issue: 38, Start page: 384001

Swansea University Authors: Alex Lord Orcid Logo, Andrew Barron Orcid Logo

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DOI (Published version): 10.1088/1361-648X/aa7dc8

Abstract

Multi-probe instruments based on scanning tunnelling microscopy (STM) are becoming increasingly common for their ability to perform nano- to atomic-scale investigations of nanostructures, surfaces and in situ reactions. A common configuration is the four-probe STM often coupled with in situ scanning...

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Published in: Journal of Physics: Condensed Matter
ISSN: 0953-8984 1361-648X
Published: 2017
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URI: https://cronfa.swan.ac.uk/Record/cronfa35875
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fullrecord <?xml version="1.0"?><rfc1807><datestamp>2020-06-02T16:29:10.4539022</datestamp><bib-version>v2</bib-version><id>35875</id><entry>2017-10-02</entry><title>Surface sensitivity of four-probe STM resistivity measurements of bulk ZnO correlated to XPS</title><swanseaauthors><author><sid>d547bad707e12f5a9f12d4fcbeea87ed</sid><ORCID>0000-0002-6258-2187</ORCID><firstname>Alex</firstname><surname>Lord</surname><name>Alex Lord</name><active>true</active><ethesisStudent>false</ethesisStudent></author><author><sid>92e452f20936d688d36f91c78574241d</sid><ORCID>0000-0002-2018-8288</ORCID><firstname>Andrew</firstname><surname>Barron</surname><name>Andrew Barron</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2017-10-02</date><deptcode>EEN</deptcode><abstract>Multi-probe instruments based on scanning tunnelling microscopy (STM) are becoming increasingly common for their ability to perform nano- to atomic-scale investigations of nanostructures, surfaces and in situ reactions. A common configuration is the four-probe STM often coupled with in situ scanning electron microscopy (SEM) that allows precise positioning of the probes onto surfaces and nanostructures enabling electrical and scanning experiments to be performed on highly localised regions of the sample. In this paper, we assess the sensitivity of four-probe STM for in-line resistivity measurements of the bulk ZnO surface. The measurements allow comparisons to established models that are used to relate light plasma treatments (O and H) of the surfaces to the resistivity measurements. The results are correlated to x-ray photoelectron spectroscopy (XPS) and show that four-probe STM can detect changes in surface and bulk conduction mechanisms that are beyond conventional monochromatic XPS.</abstract><type>Journal Article</type><journal>Journal of Physics: Condensed Matter</journal><volume>29</volume><journalNumber>38</journalNumber><paginationStart>384001</paginationStart><publisher/><issnPrint>0953-8984</issnPrint><issnElectronic>1361-648X</issnElectronic><keywords>four-probe STM, XPS, ZnO, surface modification, resistivity, oxygen, hydrogen</keywords><publishedDay>16</publishedDay><publishedMonth>8</publishedMonth><publishedYear>2017</publishedYear><publishedDate>2017-08-16</publishedDate><doi>10.1088/1361-648X/aa7dc8</doi><url/><notes/><college>COLLEGE NANME</college><department>Engineering</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>EEN</DepartmentCode><institution>Swansea University</institution><apcterm/><lastEdited>2020-06-02T16:29:10.4539022</lastEdited><Created>2017-10-02T16:02:59.7162473</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Engineering and Applied Sciences - Chemical Engineering</level></path><authors><author><firstname>Alex</firstname><surname>Lord</surname><orcid>0000-0002-6258-2187</orcid><order>1</order></author><author><firstname>Jonathan E</firstname><surname>Evans</surname><order>2</order></author><author><firstname>Chris J</firstname><surname>Barnett</surname><order>3</order></author><author><firstname>Martin W</firstname><surname>Allen</surname><order>4</order></author><author><firstname>Andrew</firstname><surname>Barron</surname><orcid>0000-0002-2018-8288</orcid><order>5</order></author><author><firstname>Steve P</firstname><surname>Wilks</surname><order>6</order></author></authors><documents><document><filename>0035875-03102017132126.pdf</filename><originalFilename>lord2017(2).pdf</originalFilename><uploaded>2017-10-03T13:21:26.8330000</uploaded><type>Output</type><contentLength>1289107</contentLength><contentType>application/pdf</contentType><version>Accepted Manuscript</version><cronfaStatus>true</cronfaStatus><embargoDate>2018-07-05T00:00:00.0000000</embargoDate><copyrightCorrect>true</copyrightCorrect><language>eng</language></document></documents><OutputDurs/></rfc1807>
spelling 2020-06-02T16:29:10.4539022 v2 35875 2017-10-02 Surface sensitivity of four-probe STM resistivity measurements of bulk ZnO correlated to XPS d547bad707e12f5a9f12d4fcbeea87ed 0000-0002-6258-2187 Alex Lord Alex Lord true false 92e452f20936d688d36f91c78574241d 0000-0002-2018-8288 Andrew Barron Andrew Barron true false 2017-10-02 EEN Multi-probe instruments based on scanning tunnelling microscopy (STM) are becoming increasingly common for their ability to perform nano- to atomic-scale investigations of nanostructures, surfaces and in situ reactions. A common configuration is the four-probe STM often coupled with in situ scanning electron microscopy (SEM) that allows precise positioning of the probes onto surfaces and nanostructures enabling electrical and scanning experiments to be performed on highly localised regions of the sample. In this paper, we assess the sensitivity of four-probe STM for in-line resistivity measurements of the bulk ZnO surface. The measurements allow comparisons to established models that are used to relate light plasma treatments (O and H) of the surfaces to the resistivity measurements. The results are correlated to x-ray photoelectron spectroscopy (XPS) and show that four-probe STM can detect changes in surface and bulk conduction mechanisms that are beyond conventional monochromatic XPS. Journal Article Journal of Physics: Condensed Matter 29 38 384001 0953-8984 1361-648X four-probe STM, XPS, ZnO, surface modification, resistivity, oxygen, hydrogen 16 8 2017 2017-08-16 10.1088/1361-648X/aa7dc8 COLLEGE NANME Engineering COLLEGE CODE EEN Swansea University 2020-06-02T16:29:10.4539022 2017-10-02T16:02:59.7162473 Faculty of Science and Engineering School of Engineering and Applied Sciences - Chemical Engineering Alex Lord 0000-0002-6258-2187 1 Jonathan E Evans 2 Chris J Barnett 3 Martin W Allen 4 Andrew Barron 0000-0002-2018-8288 5 Steve P Wilks 6 0035875-03102017132126.pdf lord2017(2).pdf 2017-10-03T13:21:26.8330000 Output 1289107 application/pdf Accepted Manuscript true 2018-07-05T00:00:00.0000000 true eng
title Surface sensitivity of four-probe STM resistivity measurements of bulk ZnO correlated to XPS
spellingShingle Surface sensitivity of four-probe STM resistivity measurements of bulk ZnO correlated to XPS
Alex Lord
Andrew Barron
title_short Surface sensitivity of four-probe STM resistivity measurements of bulk ZnO correlated to XPS
title_full Surface sensitivity of four-probe STM resistivity measurements of bulk ZnO correlated to XPS
title_fullStr Surface sensitivity of four-probe STM resistivity measurements of bulk ZnO correlated to XPS
title_full_unstemmed Surface sensitivity of four-probe STM resistivity measurements of bulk ZnO correlated to XPS
title_sort Surface sensitivity of four-probe STM resistivity measurements of bulk ZnO correlated to XPS
author_id_str_mv d547bad707e12f5a9f12d4fcbeea87ed
92e452f20936d688d36f91c78574241d
author_id_fullname_str_mv d547bad707e12f5a9f12d4fcbeea87ed_***_Alex Lord
92e452f20936d688d36f91c78574241d_***_Andrew Barron
author Alex Lord
Andrew Barron
author2 Alex Lord
Jonathan E Evans
Chris J Barnett
Martin W Allen
Andrew Barron
Steve P Wilks
format Journal article
container_title Journal of Physics: Condensed Matter
container_volume 29
container_issue 38
container_start_page 384001
publishDate 2017
institution Swansea University
issn 0953-8984
1361-648X
doi_str_mv 10.1088/1361-648X/aa7dc8
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Engineering and Applied Sciences - Chemical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Chemical Engineering
document_store_str 1
active_str 0
description Multi-probe instruments based on scanning tunnelling microscopy (STM) are becoming increasingly common for their ability to perform nano- to atomic-scale investigations of nanostructures, surfaces and in situ reactions. A common configuration is the four-probe STM often coupled with in situ scanning electron microscopy (SEM) that allows precise positioning of the probes onto surfaces and nanostructures enabling electrical and scanning experiments to be performed on highly localised regions of the sample. In this paper, we assess the sensitivity of four-probe STM for in-line resistivity measurements of the bulk ZnO surface. The measurements allow comparisons to established models that are used to relate light plasma treatments (O and H) of the surfaces to the resistivity measurements. The results are correlated to x-ray photoelectron spectroscopy (XPS) and show that four-probe STM can detect changes in surface and bulk conduction mechanisms that are beyond conventional monochromatic XPS.
published_date 2017-08-16T03:44:48Z
_version_ 1763752110656061440
score 11.037056

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