Journal article 464 views
A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures
The Journal of Physical Chemistry Letters, Volume: 13, Issue: 6, Pages: 1578 - 1586
Swansea University Author:
Richard Palmer
Full text not available from this repository: check for access using links below.
DOI (Published version): 10.1021/acs.jpclett.1c03877
Abstract
The development of patterning materials (“resists”) at the nanoscale involves two distinct trends: one is toward high sensitivity and resolution for miniaturization, the other aims at functionalization of the resists to realize bottomup construction of distinct nanoarchitectures. Patterning of carbo...
Published in: | The Journal of Physical Chemistry Letters |
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ISSN: | 1948-7185 1948-7185 |
Published: |
American Chemical Society (ACS)
2022
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Online Access: |
Check full text
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URI: | https://cronfa.swan.ac.uk/Record/cronfa60488 |
Abstract: |
The development of patterning materials (“resists”) at the nanoscale involves two distinct trends: one is toward high sensitivity and resolution for miniaturization, the other aims at functionalization of the resists to realize bottomup construction of distinct nanoarchitectures. Patterning of carbon nanostructures, a seemingly ideal application for organic functional resists, has been highly relianton complicated pattern transfer processes because of a lack of patternable precursors. Herein, we present a fullerene−metal coordination complex as a fabrication material for direct functional patterning of sub-10 nm metal-containing carbon structures. The attachment of one platinum atom per fullerene molecule not only leads to significant improvement of sensitivity and resolution but also enables stable atomic dispersion of the platinum ions within the carbon matrix, which may gain fundamentally new interest in functional patterning of hierarchical carbon nanostructures. |
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College: |
Faculty of Science and Engineering |
Issue: |
6 |
Start Page: |
1578 |
End Page: |
1586 |