Maffeis, T. (2008). Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers. Journal of Applied Physics. doi:10.1063/1.2888522
Chicago Style CitationMaffeis, Thierry. "Ni∕Al[sub 0.2]Ga[sub 0.8]N Interfacial Reaction and Schottky Contact Formation Using High Quality Epitaxial Layers." Journal of Applied Physics 2008.
MLA CitationMaffeis, Thierry. "Ni∕Al[sub 0.2]Ga[sub 0.8]N Interfacial Reaction and Schottky Contact Formation Using High Quality Epitaxial Layers." Journal of Applied Physics 2008.
Warning: These citations may not always be 100% accurate.