Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel

Lei, C.; Burton, M.; Nandhakumar, Iris S.; Burton, Matthew

doi:10.1149/2.1151704jes

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Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel

C. Lei, M. Burton, Iris S. Nandhakumar, Matthew Burton

Journal of The Electrochemical Society, Volume: 164, Issue: 4, Pages: D192 - D195

Swansea University Author: Matthew Burton

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DOI (Published version): 10.1149/2.1151704jes

Abstract

Bismuth-telluride-based alloys are currently the best commercially available thermoelectric materials for applications at room temperatures. Up to 150 micron thick layers of bismuth antimony telluride (Bi0.5Sb1.5Te3) were directly deposited onto nickel by either potenstiostatic or potentiodynamic el...

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Published in:	Journal of The Electrochemical Society
ISSN:	0013-4651 1945-7111
Published:	2017
Online Access:	Check full text
URI:	https://cronfa.swan.ac.uk/Record/cronfa50239

first_indexed	2019-05-09T20:01:17Z
last_indexed	2019-07-18T21:34:51Z
id	cronfa50239
recordtype	SURis
fullrecord	<?xml version="1.0"?><rfc1807><datestamp>2019-07-18T14:49:25.1773700</datestamp><bib-version>v2</bib-version><id>50239</id><entry>2019-05-07</entry><title>Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel</title><swanseaauthors><author><sid>2deade2806e39b1f749e9cf67ac640b2</sid><ORCID>0000-0002-0376-6322</ORCID><firstname>Matthew</firstname><surname>Burton</surname><name>Matthew Burton</name><active>true</active><ethesisStudent>false</ethesisStudent></author></swanseaauthors><date>2019-05-07</date><deptcode>EAAS</deptcode><abstract>Bismuth-telluride-based alloys are currently the best commercially available thermoelectric materials for applications at room temperatures. Up to 150 micron thick layers of bismuth antimony telluride (Bi0.5Sb1.5Te3) were directly deposited onto nickel by either potenstiostatic or potentiodynamic electrodeposition. Cyclic voltammetry was employed to identify the optimal deposition potential. The films were characterized by scanning electron microscopy, energy dispersive X-rays and X-ray diffraction. The p-type films were found to be well adherent, uniform and stoichiometric with a high power factor of 2.3 × 10−4 W m−1 K−2 at film growth rates of up to 40 μm h−1.</abstract><type>Journal Article</type><journal>Journal of The Electrochemical Society</journal><volume>164</volume><journalNumber>4</journalNumber><paginationStart>D192</paginationStart><paginationEnd>D195</paginationEnd><publisher/><issnPrint>0013-4651</issnPrint><issnElectronic>1945-7111</issnElectronic><keywords>bismuth antimony telluride, electrodeposition, nickel, p-type, thermoelectrics, thick films</keywords><publishedDay>31</publishedDay><publishedMonth>12</publishedMonth><publishedYear>2017</publishedYear><publishedDate>2017-12-31</publishedDate><doi>10.1149/2.1151704jes</doi><url/><notes/><college>COLLEGE NANME</college><department>Engineering and Applied Sciences School</department><CollegeCode>COLLEGE CODE</CollegeCode><DepartmentCode>EAAS</DepartmentCode><institution>Swansea University</institution><apcterm/><lastEdited>2019-07-18T14:49:25.1773700</lastEdited><Created>2019-05-07T09:57:01.9794580</Created><path><level id="1">Faculty of Science and Engineering</level><level id="2">School of Engineering and Applied Sciences - Materials Science and Engineering</level></path><authors><author><firstname>C.</firstname><surname>Lei</surname><order>1</order></author><author><firstname>M.</firstname><surname>Burton</surname><order>2</order></author><author><firstname>Iris S.</firstname><surname>Nandhakumar</surname><order>3</order></author><author><firstname>Matthew</firstname><surname>Burton</surname><orcid>0000-0002-0376-6322</orcid><order>4</order></author></authors><documents><document><filename>0050239-13052019105148.pdf</filename><originalFilename>lei2017.pdf</originalFilename><uploaded>2019-05-13T10:51:48.8700000</uploaded><type>Output</type><contentLength>2480738</contentLength><contentType>application/pdf</contentType><version>Version of Record</version><cronfaStatus>true</cronfaStatus><embargoDate>2019-05-13T00:00:00.0000000</embargoDate><documentNotes>Distributed under the terms of a Creative Commons Attribution (CC-BY-4.0)</documentNotes><copyrightCorrect>true</copyrightCorrect><language>eng</language></document></documents><OutputDurs/></rfc1807>
spelling	2019-07-18T14:49:25.1773700 v2 50239 2019-05-07 Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel 2deade2806e39b1f749e9cf67ac640b2 0000-0002-0376-6322 Matthew Burton Matthew Burton true false 2019-05-07 EAAS Bismuth-telluride-based alloys are currently the best commercially available thermoelectric materials for applications at room temperatures. Up to 150 micron thick layers of bismuth antimony telluride (Bi0.5Sb1.5Te3) were directly deposited onto nickel by either potenstiostatic or potentiodynamic electrodeposition. Cyclic voltammetry was employed to identify the optimal deposition potential. The films were characterized by scanning electron microscopy, energy dispersive X-rays and X-ray diffraction. The p-type films were found to be well adherent, uniform and stoichiometric with a high power factor of 2.3 × 10−4 W m−1 K−2 at film growth rates of up to 40 μm h−1. Journal Article Journal of The Electrochemical Society 164 4 D192 D195 0013-4651 1945-7111 bismuth antimony telluride, electrodeposition, nickel, p-type, thermoelectrics, thick films 31 12 2017 2017-12-31 10.1149/2.1151704jes COLLEGE NANME Engineering and Applied Sciences School COLLEGE CODE EAAS Swansea University 2019-07-18T14:49:25.1773700 2019-05-07T09:57:01.9794580 Faculty of Science and Engineering School of Engineering and Applied Sciences - Materials Science and Engineering C. Lei 1 M. Burton 2 Iris S. Nandhakumar 3 Matthew Burton 0000-0002-0376-6322 4 0050239-13052019105148.pdf lei2017.pdf 2019-05-13T10:51:48.8700000 Output 2480738 application/pdf Version of Record true 2019-05-13T00:00:00.0000000 Distributed under the terms of a Creative Commons Attribution (CC-BY-4.0) true eng
title	Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel
spellingShingle	Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel Matthew Burton
title_short	Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel
title_full	Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel
title_fullStr	Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel
title_full_unstemmed	Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel
title_sort	Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel
author_id_str_mv	2deade2806e39b1f749e9cf67ac640b2
author_id_fullname_str_mv	2deade2806e39b1f749e9cf67ac640b2_***_Matthew Burton
author	Matthew Burton
author2	C. Lei M. Burton Iris S. Nandhakumar Matthew Burton
format	Journal article
container_title	Journal of The Electrochemical Society
container_volume	164
container_issue	4
container_start_page	D192
publishDate	2017
institution	Swansea University
issn	0013-4651 1945-7111
doi_str_mv	10.1149/2.1151704jes
college_str	Faculty of Science and Engineering
hierarchytype
hierarchy_top_id	facultyofscienceandengineering
hierarchy_top_title	Faculty of Science and Engineering
hierarchy_parent_id	facultyofscienceandengineering
hierarchy_parent_title	Faculty of Science and Engineering
department_str	School of Engineering and Applied Sciences - Materials Science and Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Materials Science and Engineering
document_store_str	1
active_str	0
description	Bismuth-telluride-based alloys are currently the best commercially available thermoelectric materials for applications at room temperatures. Up to 150 micron thick layers of bismuth antimony telluride (Bi0.5Sb1.5Te3) were directly deposited onto nickel by either potenstiostatic or potentiodynamic electrodeposition. Cyclic voltammetry was employed to identify the optimal deposition potential. The films were characterized by scanning electron microscopy, energy dispersive X-rays and X-ray diffraction. The p-type films were found to be well adherent, uniform and stoichiometric with a high power factor of 2.3 × 10−4 W m−1 K−2 at film growth rates of up to 40 μm h−1.
published_date	2017-12-31T01:57:59Z
_version_	1821368835996909568
score	11.04748

Electrochemical Formation of p-Type Bi0.5Sb1.5Te3Thick Films onto Nickel

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