Journal article 482 views
Chemically amplified fullerene resists, spin-on fullerene hardmasks and high aspect ratio etching
Richard Palmer 
Swansea University Author:
Richard Palmer
Abstract
Chemically amplified fullerene resists, spin-on fullerene hardmasks and high aspect ratio etching
| Published: |
2012
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| URI: | https://cronfa.swan.ac.uk/Record/cronfa49280 |
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| College: |
Faculty of Science and Engineering |
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