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Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching

Andreas Frommhold, Richard Palmer Orcid Logo, Alex P. G. Robinson

Journal of Micro/Nanolithography, MEMS, and MOEMS, Volume: 12, Issue: 3, Start page: 033003

Swansea University Author: Richard Palmer Orcid Logo

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DOI (Published version): 10.1117/1.JMM.12.3.033003

Published in: Journal of Micro/Nanolithography, MEMS, and MOEMS
ISSN: 1932-5150
Published: 2013
Online Access: Check full text

URI: https://cronfa.swan.ac.uk/Record/cronfa49275
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spelling 2019-03-18T14:30:18.4294116 v2 49275 2019-03-18 Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching 6ae369618efc7424d9774377536ea519 0000-0001-8728-8083 Richard Palmer Richard Palmer true false 2019-03-18 ACEM Journal Article Journal of Micro/Nanolithography, MEMS, and MOEMS 12 3 033003 1932-5150 31 12 2013 2013-12-31 10.1117/1.JMM.12.3.033003 COLLEGE NANME Aerospace, Civil, Electrical, and Mechanical Engineering COLLEGE CODE ACEM Swansea University 2019-03-18T14:30:18.4294116 2019-03-18T14:30:18.2030869 Faculty of Science and Engineering School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering Andreas Frommhold 1 Richard Palmer 0000-0001-8728-8083 2 Alex P. G. Robinson 3
title Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching
spellingShingle Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching
Richard Palmer
title_short Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching
title_full Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching
title_fullStr Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching
title_full_unstemmed Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching
title_sort Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching
author_id_str_mv 6ae369618efc7424d9774377536ea519
author_id_fullname_str_mv 6ae369618efc7424d9774377536ea519_***_Richard Palmer
author Richard Palmer
author2 Andreas Frommhold
Richard Palmer
Alex P. G. Robinson
format Journal article
container_title Journal of Micro/Nanolithography, MEMS, and MOEMS
container_volume 12
container_issue 3
container_start_page 033003
publishDate 2013
institution Swansea University
issn 1932-5150
doi_str_mv 10.1117/1.JMM.12.3.033003
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Aerospace, Civil, Electrical, General and Mechanical Engineering - Mechanical Engineering
document_store_str 0
active_str 0
published_date 2013-12-31T07:47:19Z
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score 11.048216

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