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High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching

M. Aljada, K. Mutkins, G. Vamvounis, P. Burn, P. Meredith, Paul Meredith Orcid Logo

Journal of Micromechanics and Microengineering, Volume: 20, Issue: 7, Start page: 075037

Swansea University Author: Paul Meredith Orcid Logo

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DOI (Published version): 10.1088/0960-1317/20/7/075037

Published in: Journal of Micromechanics and Microengineering
ISSN: 0960-1317 1361-6439
Published: 2010
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URI: https://cronfa.swan.ac.uk/Record/cronfa38655
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first_indexed 2018-02-15T14:38:59Z
last_indexed 2018-02-15T14:38:59Z
id cronfa38655
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spelling 2018-02-15T08:36:50.8143300 v2 38655 2018-02-15 High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching 31e8fe57fa180d418afd48c3af280c2e 0000-0002-9049-7414 Paul Meredith Paul Meredith true false 2018-02-15 SPH Journal Article Journal of Micromechanics and Microengineering 20 7 075037 0960-1317 1361-6439 31 12 2010 2010-12-31 10.1088/0960-1317/20/7/075037 http://www.scopus.com/inward/record.url?eid=2-s2.0-77955352849&amp;partnerID=MN8TOARS COLLEGE NANME Physics COLLEGE CODE SPH Swansea University 2018-02-15T08:36:50.8143300 2018-02-15T08:36:50.6115005 Faculty of Science and Engineering School of Biosciences, Geography and Physics - Physics M. Aljada 1 K. Mutkins 2 G. Vamvounis 3 P. Burn 4 P. Meredith 5 Paul Meredith 0000-0002-9049-7414 6
title High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching
spellingShingle High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching
Paul Meredith
title_short High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching
title_full High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching
title_fullStr High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching
title_full_unstemmed High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching
title_sort High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching
author_id_str_mv 31e8fe57fa180d418afd48c3af280c2e
author_id_fullname_str_mv 31e8fe57fa180d418afd48c3af280c2e_***_Paul Meredith
author Paul Meredith
author2 M. Aljada
K. Mutkins
G. Vamvounis
P. Burn
P. Meredith
Paul Meredith
format Journal article
container_title Journal of Micromechanics and Microengineering
container_volume 20
container_issue 7
container_start_page 075037
publishDate 2010
institution Swansea University
issn 0960-1317
1361-6439
doi_str_mv 10.1088/0960-1317/20/7/075037
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Biosciences, Geography and Physics - Physics{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Biosciences, Geography and Physics - Physics
url http://www.scopus.com/inward/record.url?eid=2-s2.0-77955352849&amp;partnerID=MN8TOARS
document_store_str 0
active_str 0
published_date 2010-12-31T03:48:57Z
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score 11.013148

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