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Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition

M Chhowalla, KBK Teo, C Ducati, NL Rupesinghe, GAJ Amaratunga, AC Ferrari, D Roy, J Robertson, WI Milne, Deb Roy Orcid Logo

Journal of Applied Physics, Volume: 90, Issue: 10, Pages: 5308 - 5317

Swansea University Author: Deb Roy Orcid Logo

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DOI (Published version): 10.1063/1.1410322

Published in: Journal of Applied Physics
ISSN: 0021-8979 1089-7550
Published: 2001
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URI: https://cronfa.swan.ac.uk/Record/cronfa37251
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last_indexed 2018-02-09T05:30:29Z
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spelling 2017-11-28T15:08:38.5626691 v2 37251 2017-11-28 Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition a18d76438369122184e83fb683d8d787 0000-0002-7528-8649 Deb Roy Deb Roy true false 2017-11-28 EAAS Journal Article Journal of Applied Physics 90 10 5308 5317 0021-8979 1089-7550 31 12 2001 2001-12-31 10.1063/1.1410322 http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&amp;SrcAuth=ORCID&amp;SrcApp=OrcidOrg&amp;DestLinkType=FullRecord&amp;DestApp=WOS_CPL&amp;KeyUT=WOS:000171918700068&amp;KeyUID=WOS:000171918700068 COLLEGE NANME Engineering and Applied Sciences School COLLEGE CODE EAAS Swansea University 2017-11-28T15:08:38.5626691 2017-11-28T15:08:38.3754599 Faculty of Science and Engineering School of Engineering and Applied Sciences - Chemistry M Chhowalla 1 KBK Teo 2 C Ducati 3 NL Rupesinghe 4 GAJ Amaratunga 5 AC Ferrari 6 D Roy 7 J Robertson 8 WI Milne 9 Deb Roy 0000-0002-7528-8649 10
title Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition
spellingShingle Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition
Deb Roy
title_short Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition
title_full Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition
title_fullStr Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition
title_full_unstemmed Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition
title_sort Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition
author_id_str_mv a18d76438369122184e83fb683d8d787
author_id_fullname_str_mv a18d76438369122184e83fb683d8d787_***_Deb Roy
author Deb Roy
author2 M Chhowalla
KBK Teo
C Ducati
NL Rupesinghe
GAJ Amaratunga
AC Ferrari
D Roy
J Robertson
WI Milne
Deb Roy
format Journal article
container_title Journal of Applied Physics
container_volume 90
container_issue 10
container_start_page 5308
publishDate 2001
institution Swansea University
issn 0021-8979
1089-7550
doi_str_mv 10.1063/1.1410322
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Engineering and Applied Sciences - Chemistry{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Chemistry
url http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&amp;SrcAuth=ORCID&amp;SrcApp=OrcidOrg&amp;DestLinkType=FullRecord&amp;DestApp=WOS_CPL&amp;KeyUT=WOS:000171918700068&amp;KeyUID=WOS:000171918700068
document_store_str 0
active_str 0
published_date 2001-12-31T04:15:21Z
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score 11.089407

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