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Imbedding germanium quantum dots in silica by a modified Stöber method

Hannah Rutledge, Brittany L. Oliva-Chatelain, Samuel J. Maguire-Boyle, Dennis L. Flood, Andrew Barron Orcid Logo

Materials Science in Semiconductor Processing, Volume: 17, Pages: 7 - 12

Swansea University Author: Andrew Barron Orcid Logo

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DOI (Published version): 10.1016/j.mssp.2013.08.005

Published in: Materials Science in Semiconductor Processing
Published: 2013
Online Access: http://www.sciencedirect.com/science/article/pii/S1369800113002436
URI: https://cronfa.swan.ac.uk/Record/cronfa22207
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first_indexed 2015-06-27T02:06:59Z
last_indexed 2018-02-09T05:00:26Z
id cronfa22207
recordtype SURis
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spelling 2015-06-26T16:14:28.2062540 v2 22207 2015-06-26 Imbedding germanium quantum dots in silica by a modified Stöber method 92e452f20936d688d36f91c78574241d 0000-0002-2018-8288 Andrew Barron Andrew Barron true false 2015-06-26 CHEG Journal Article Materials Science in Semiconductor Processing 17 7 12 3 9 2013 2013-09-03 10.1016/j.mssp.2013.08.005 http://www.sciencedirect.com/science/article/pii/S1369800113002436 COLLEGE NANME Chemical Engineering COLLEGE CODE CHEG Swansea University 2015-06-26T16:14:28.2062540 2015-06-26T16:14:28.2062540 Faculty of Science and Engineering School of Engineering and Applied Sciences - Chemical Engineering Hannah Rutledge 1 Brittany L. Oliva-Chatelain 2 Samuel J. Maguire-Boyle 3 Dennis L. Flood 4 Andrew Barron 0000-0002-2018-8288 5
title Imbedding germanium quantum dots in silica by a modified Stöber method
spellingShingle Imbedding germanium quantum dots in silica by a modified Stöber method
Andrew Barron
title_short Imbedding germanium quantum dots in silica by a modified Stöber method
title_full Imbedding germanium quantum dots in silica by a modified Stöber method
title_fullStr Imbedding germanium quantum dots in silica by a modified Stöber method
title_full_unstemmed Imbedding germanium quantum dots in silica by a modified Stöber method
title_sort Imbedding germanium quantum dots in silica by a modified Stöber method
author_id_str_mv 92e452f20936d688d36f91c78574241d
author_id_fullname_str_mv 92e452f20936d688d36f91c78574241d_***_Andrew Barron
author Andrew Barron
author2 Hannah Rutledge
Brittany L. Oliva-Chatelain
Samuel J. Maguire-Boyle
Dennis L. Flood
Andrew Barron
format Journal article
container_title Materials Science in Semiconductor Processing
container_volume 17
container_start_page 7
publishDate 2013
institution Swansea University
doi_str_mv 10.1016/j.mssp.2013.08.005
college_str Faculty of Science and Engineering
hierarchytype
hierarchy_top_id facultyofscienceandengineering
hierarchy_top_title Faculty of Science and Engineering
hierarchy_parent_id facultyofscienceandengineering
hierarchy_parent_title Faculty of Science and Engineering
department_str School of Engineering and Applied Sciences - Chemical Engineering{{{_:::_}}}Faculty of Science and Engineering{{{_:::_}}}School of Engineering and Applied Sciences - Chemical Engineering
url http://www.sciencedirect.com/science/article/pii/S1369800113002436
document_store_str 0
active_str 0
published_date 2013-09-03T03:26:25Z
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score 11.014067

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