Hou, Y., Jia, H., Tang, M., Mosberg, A. B., Ramasse, Q. M., Skandalos, I., . . . Gardes, F. (2022). A thermally erasable silicon oxide layer for molecular beam epitaxy. Journal of Physics D: Applied Physics, 55(42), . doi:10.1088/1361-6463/ac8600

Hou, Yaonan, et al. "A Thermally Erasable Silicon Oxide Layer for Molecular Beam Epitaxy." Journal of Physics D: Applied Physics 55, no. 42 (2022).

Hou, Yaonan, et al. "A Thermally Erasable Silicon Oxide Layer for Molecular Beam Epitaxy." Journal of Physics D: Applied Physics 55.42 (2022).