Palmer, R. (1999). Fullerene derivatives as novel resist materials for fabrication of MEMS devices by electron beam lithography.
Chicago Style CitationPalmer, Richard. Fullerene Derivatives As Novel Resist Materials for Fabrication of MEMS Devices By Electron Beam Lithography. 1999.
MLA CitationPalmer, Richard. Fullerene Derivatives As Novel Resist Materials for Fabrication of MEMS Devices By Electron Beam Lithography. 1999.
Warning: These citations may not always be 100% accurate.