Palmer, R. (2007). Chemically amplified molecular resists for e-beam lithography.
Chicago Style CitationPalmer, Richard. Chemically Amplified Molecular Resists for E-beam Lithography. 2007.
MLA CitationPalmer, Richard. Chemically Amplified Molecular Resists for E-beam Lithography. 2007.
Warning: These citations may not always be 100% accurate.