APA Citation

Palmer, R. (2008). Chemically amplified fullerene resists for e-beam lithography - art. no. 69230M.

Chicago Style Citation

Palmer, Richard. Chemically Amplified Fullerene Resists for E-beam Lithography - Art. No. 69230M. 2008.

MLA Citation

Palmer, Richard. Chemically Amplified Fullerene Resists for E-beam Lithography - Art. No. 69230M. 2008.

Warning: These citations may not always be 100% accurate.