Palmer, R., Somervell, M. H., Frommhold, A., Yang, D. X., McClelland, A., Xue, X., . . . Robinson, A. P. G. (2013). EUV lithography performance of negative-tone chemically amplified fullerene resist.
Chicago Style CitationPalmer, Richard, Mark H. Somervell, A. Frommhold, D. X. Yang, A. McClelland, X. Xue, R. E. Palmer, and A. P. G. Robinson. EUV Lithography Performance of Negative-tone Chemically Amplified Fullerene Resist. 2013.
MLA CitationPalmer, Richard, et al. EUV Lithography Performance of Negative-tone Chemically Amplified Fullerene Resist. 2013.
Warning: These citations may not always be 100% accurate.