Palmer, R., Wallow, T. I., Hohle, C. K., Frommhold, A., McClelland, A., Yang, D., . . . Robinson, A. P. G. (2015). Towards 11 nm half-pitch Resolution for a Negative-tone Chemically Amplified Molecular Resist Platform for EUV Lithography.
Chicago Style CitationPalmer, Richard, et al. Towards 11 Nm Half-pitch Resolution for a Negative-tone Chemically Amplified Molecular Resist Platform for EUV Lithography. 2015.
MLA CitationPalmer, Richard, et al. Towards 11 Nm Half-pitch Resolution for a Negative-tone Chemically Amplified Molecular Resist Platform for EUV Lithography. 2015.
Warning: These citations may not always be 100% accurate.