McGettrick, J., Speller, E., Li, Z., Tsoi, W. C., Durrant, J., Watson, T., & Tsoi, W. C. (2017). Use of gas cluster ion source depth profiling to study the oxidation of fullerene thin films by XPS. Organic Electronics, 49, pp. 85-93. doi:10.1016/j.orgel.2017.06.022

McGettrick, James, Emily Speller, Zhe Li, Wing C. Tsoi, James Durrant, Trystan Watson, and Wing Chung Tsoi. "Use of Gas Cluster Ion Source Depth Profiling to Study the Oxidation of Fullerene Thin Films By XPS." Organic Electronics 49 (2017): 85-93.

McGettrick, James, et al. "Use of Gas Cluster Ion Source Depth Profiling to Study the Oxidation of Fullerene Thin Films By XPS." Organic Electronics 49 (2017): 85-93.